2006年10月
Novel molecular resist based on a first generation dendrimer possessing furan rings
MACROMOLECULAR RAPID COMMUNICATIONS
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- 巻
- 27
- 号
- 20
- 開始ページ
- 1792
- 終了ページ
- 1796
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1002/marc.200600454
- 出版者・発行元
- WILEY-V C H VERLAG GMBH
A novel chemically amplified negative-tone molecular resist for electron-beam (EB) lithography was developed. The base matrix had six furan rings as a reactive functional group at its terminal. The resist containing the matrix, a crosslinker and a photoacid generator worked well I Communication as a negative-tone resist with high sensitivity (3 mu C center dot cm(-2))(.) Line and space patterns (1:2) of 200 nm could be fabricated.
- リンク情報
- ID情報
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- DOI : 10.1002/marc.200600454
- ISSN : 1022-1336
- CiNii Articles ID : 80018813723
- Web of Science ID : WOS:000241870300013