1994年7月
NITRIDATION OF VANADIUM BY ION-BEAM IRRADIATION
SURFACE & COATINGS TECHNOLOGY
- ,
- ,
- 巻
- 65
- 号
- 1-3
- 開始ページ
- 142
- 終了ページ
- 147
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1016/S0257-8972(94)80021-9
- 出版者・発行元
- ELSEVIER SCIENCE SA LAUSANNE
The nitridation of vanadium by ion beam irradiation is studied by the ion implantation method and the dynamic mixing method. The nitrogen ion implantation was carried out into deposited V(110) films. Using both methods, three phases are formed, i.e. alpha-V, beta-V2N, and delta-VN. Which phases are formed is related to the implantation dose or the arrival ratio. The orientation of the VN films produced by the dynamic ion beam mixing method is (100) and that of the VN films produced by the ion implantation method is (111). The nitridation of vanadium is also discussed in comparison with that of titanium and chromium.
- リンク情報
- ID情報
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- DOI : 10.1016/S0257-8972(94)80021-9
- ISSN : 0257-8972
- Web of Science ID : WOS:A1994NX76000022