林 幸裕

Y. Hayashi, A. Sakai, H. Ikeda, S. Zaima and Y. Yasuda, Surface and Interface Smoothing of Epitaxial CoSi₂ Films by Solid-Phase Epitaxy Using Adsorbed Oxygen Layers and Two-Step Growth on Si(001) Surfaces 

Japanese Journal of Applied Physics Vol. 42 pp. 7039-7044 2003年  

Y. Hayashi, T. Katoh, H. Ikeda, A. Sakai, S. Zaima and Y. Yasuda Application of a two-step Growth to the formation of epitaxial CoSi₂ films on Si(001) surfaces:Comparative study using Reactive deposition epitaxy 

Japanese Journal of Applied Physics Vol. 40 269-275 2001年  

Y. Hayashi, T. Katoh, H. Ikeda, A. Sakai, S. Zaima and Y. Yasuda Application of a two-step Growth to the formation of epitaxial CoSi₂ films on Si(001) surfaces:Comparative study using Reactive deposition epitaxy 

Japanese Journal of Applied Physics Vol. 40 269-275 2001年  

Y. Hayashi, Y. Matsuoka, T. Katoh, H. Ikegami, H. Ikeda, S. Zaima and Y. Yasuda, A new growth method of epitaxial cobalt disilicide on Si(100), 

Advanced Metalization and Interconnect Systems for ULSI Applications in 1997 (Materials Research Society, Warrendale, PA, 1998) pp.663-668  

Y. Hayashi, Y. Matsuoka, H. Ikeda, S. Zaima and Y. Yasuda, Effects of initial surface states on formation processes of epitaxial CoSi₂(100) on Si(100) 

Thin Solid Films 343-344 (1999) 562-566  

Y. Hayashi, M. Yoshinaga, H. Ikeda, S. Zaima and Y. Yasuda, Solid-phase epitaxial growth of CoSi₂ on oxygen-adsorbed Si(001) surfaces 

Surface Science 438 (1999) 116-122  

Y. Hayashi, A. Sakai, H. Ikeda, S. Zaima and Y. Yasuda, Reactive Deposition Epitaxy of CoSi₂ Films on Clean and Oxygen-Adsorbed Si(001) Surfaces 

Japanese Journal of Applied Physics Vol. 42 pp. 7482-7488  

Y. Hayashi, Y. Matsuoka, T. Katoh, H. Ikegami, H. Ikeda, S. Zaima and Y. Yasuda, A new growth method of epitaxial cobalt disilicide on Si(100) 

Advanced Metalization and Interconnect Systems for ULSI Applications in 1997 (Materials Research Society, Warrendale, PA, 1998) pp.663-668  

Y. Hayashi, Y. Matsuoka, H. Ikeda, S. Zaima amd Y. Yasuda, Effects of initial surface states on formation processes of epitaxial CoSi₂(100) on Si(100) 

Thin Solid Films 343-344 (1999) 562-566  

Y. Hayashi, M. Yoshinaga, H. Ikeda, S. Zaima and Y. Yasuda, Solid-phase epitaxial growth of CoSi₂ on oxygen-adsorbed Si(001) surfaces 

Surface Science 438 (1999) 116-122