2003年
Y. Hayashi, A. Sakai, H. Ikeda, S. Zaima and Y. Yasuda, Surface and Interface Smoothing of Epitaxial CoSi2 Films by Solid-Phase Epitaxy Using Adsorbed Oxygen Layers and Two-Step Growth on Si(001) Surfaces
Japanese Journal of Applied Physics
- 巻
- Vol. 42 pp. 7039-7044
- 号
- ID情報
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- identifiers.cinii_nr_id : 9000239248799