秦信宏 (Nobuhiro Hata) - マイポータル

基本情報

所属: 独立行政法人産業技術総合研究所ナノ電子デバイス研究センター

学位: 工学博士

J-GLOBAL ID: 200901085087060644
researchmap会員ID: 0000045274

外部リンク: http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=N53140655

研究キーワード

シリコン配線技術低誘電率材料層間絶縁膜

研究分野

学歴

MISC

Characterization of Etching Rates for Porous Silica low-k Films

Japanese Journal of Applied Physcis 45(11) 8873-8875 2006年
Skeletal silica characterization in porous-silica low-dielectric-constant films by infrared spectroscopic ellipsometry

S Takada, N Hata, Y Seino, N Fujii, T Kikkawa

JOURNAL OF APPLIED PHYSICS 97(11) 113504-113508 2005年6月
Theoretical investigation into effects of pore size and pore position distributions on dielectric constant and elastic modulus of two-dimensional periodic porous silica films

H Miyoshi, N Hata, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 44(3) 1166-1168 2005年3月
Theoretical investigation of dielectric constant and elastic modulus of two-dimensional periodic porous silica films with elliptical cylindrical pores

H Miyoshi, H Matsuo, H Tanaka, K Yamada, Y Oku, S Takada, N Hata, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 44(3) 1161-1165 2005年3月
Theoretical Investigation of the Dielectric Constant and Elastic Modulus of Three-Dimensional Isotropic Porous Silica Films with Cubic and Disordered Pore Arrangements

JAPANESE JOURNAL OF APPLIED PHYSICS 44(8) 5982-5986 2005年
Influence of humidity on electrical characteristics of self-assembled porous silica low-k films

T Kikkawa, S Kuroki, S Sakamoto, K Kohmura, H Tanaka, N Hata

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 152(7) G560-G566 2005年
Transient capacitance spectroscopy of copper-ion-drifted methylsilsesquiazane-methylsilsesquioxane interlayer dielectrics

T Yoshino, N Hata, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43(12) 8026-8027 2004年12月
Mechanical property and network structure of porous silica films

S Takada, N Hata, Y Seino, K Yamada, Y Oku, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43(5A) 2453-2456 2004年5月
Nondestructive characterization of a series of periodic porous silica films by in situ spectroscopic ellipsometry in a vapor cell

C Negoro, N Hata, K Yamada, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43(4A) 1327-1329 2004年4月
Control of pore structures in periodic porous silica low-k films

N Hata, C Negoro, K Yamada, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 43(4A) 1323-1326 2004年4月
Mechanical property determination of thin porous low-k films by twin-transducer laser generated surface acoustic waves

Xiao, X, N Hata, K Yamada, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43(2) 508-513 2004年2月
Theoretical analysis of elastic modulus and dielectric constant for low-k two-dimensional periodic porous silica films

H Miyoshi, H Matsuo, Y Oku, H Tanaka, K Yamada, N Mikami, S Takada, N Hata, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43(2) 498-503 2004年2月
Molecular orbital calculation of the elastic modulus and the dielectric constant for ultra low-k organic polymers

K Uera, J Kawahara, H Miyoshi, N Hata, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43(2) 504-507 2004年2月
Ultra-low-k Mesoporous Silica Films Fromed by Using Nonionic Surfactant Templates

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 151(10) F248-F251 2004年
Robust self-assembled monolayer as diffusion barrier for copper metallization

N Mikami, N Hata, T Kikkawa, H Machida

APPLIED PHYSICS LETTERS 83(25) 5181-5183 2003年12月
Mechanical properties of periodic porous silica low-k films determined by the twin-transducer surface acoustic wave technique

Xiao, X, N Hata, K Yamada, T Kikkawa

REVIEW OF SCIENTIFIC INSTRUMENTS 74(10) 4539-4541 2003年10月
Hot-wire photonics: materials, science, and technology

CM Fortmann, AH Mahan, S Ward, WA Anderson, R Tonucci, N Hata

THIN SOLID FILMS 430(1-2) 278-282 2003年4月
Effects of Surfactants on the properties of ordered periodic porous silica films

K Yamada, Y Oku, N Hata, S Takada, T Kikkawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 42(4B) 1840-1842 2003年4月
Evaluation of Copper Ion Drift in Low-Dielectric-Constant Interlayer Films by Transient Capacitance Spectroscopy

MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS 766 217-222 2003年
Progress in deposited refractive index engineered materials and devices

CM Fortmann, EL Jaen, WA Anderson, AH Mahan, N Hata

PHOTOREFRACTIVE FIBER AND CRYSTAL DEVICES: MATERIALS, OPTICAL PROPERTIES, AND APPLICATIONS VII, AND OPTICAL DATA STORAGE 4459 10-19 2002年

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所属学協会

共同研究・競争的資金等の研究課題

Low-k 材料・配線技術