2018年1月2日
Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film
22nd Microoptics Conference, MOC 2017
- ,
- 巻
- 2017-
- 号
- 開始ページ
- 96
- 終了ページ
- 97
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.23919/MOC.2017.8244509
- 出版者・発行元
- Institute of Electrical and Electronics Engineers Inc.
High-quality Si3N4 films with low optical loss were deposited at 150°C using LSCVD. A micro-ring resonator based on as-deposited Si3N4 with Q-factor of 5.2×104 has been demonstrated. Bragg gratings are fabricated at bus ends to improve coupling efficiency. The LSCVD deposited Si3N4 exemplify its viability as a photonic integration platform.
- リンク情報
- ID情報
-
- DOI : 10.23919/MOC.2017.8244509
- SCOPUS ID : 85045831095