High-quality silicon nitride (Si3N4) films with a low stress and optical loss were deposited at low temperature (150 degrees C) using liquid source chemical vapor deposition (LSCVD). The refractive index of the Si3N4 film was optimized by changing the composition ratio and deposition temperature. An integrated photonic structure of micro-ring resonator based on the as-deposited Si3N4 layer has been demonstrated to exemplify its viability as a photonic integration platform. Bragg gratings are fabricated at both ends of the bus waveguide to improve coupling efficiency and testing flexibility. A measured waveguide loss of 2.9 dB/cm and a high Q-factor of 5.2 x 10(4) are achieved. The LSCVD deposited Si3N4 is therefore a highly promising photonic integration platform for various integrated photonic applications. (C) 2017 Optical Society of America