2015年12月
Profile measurement of thin films by backpropagation of multiple-wavelength optical fields with two sinusoidal phase-modulating interferometers
OPTICS COMMUNICATIONS
- ,
- ,
- ,
- 巻
- 356
- 号
- 開始ページ
- 578
- 終了ページ
- 581
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1016/j.optcom.2015.08.066
- 出版者・発行元
- ELSEVIER SCIENCE BV
Optical wavelength is scanned linearly with time, and an optical field produced by a thin film on a detection plane is detected with a sinusoidal phase-modulating interferometer. Scanned wavelength is detected with another interferometer. The detected multiple-optical fields are backpropagated along the optical axis in a computer by use of the detected wavelengths. An optical field is reconstructed by summing the backpropagated fields over the multiple wavelengths. The intensity and phase distributions of the reconstructed optical field provide the positions of the thin film surfaces with an accuracy of a few nanometers. (C) 2015 Elsevier B.V. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1016/j.optcom.2015.08.066
- ISSN : 0030-4018
- eISSN : 1873-0310
- Web of Science ID : WOS:000362603600095