1991年4月
ELECTRICAL CHARACTERISTICS AND RELIABILITY OF PT/TI/PT/AU OHMIC CONTACTS TO P-TYPE GAAS
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
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回数 : 111
- ,
- ,
- 巻
- 30
- 号
- 4A
- 開始ページ
- L558
- 終了ページ
- L560
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- 出版者・発行元
- JAPAN J APPLIED PHYSICS
The ohmic contacts to p-type GaAs formed by GaAs/Pt/Ti/Pt/Au systems were investigated. The specific contact resistance below 8 x 10(-7) OMEGA.cm2 was achieved when the interface Pt between GaAs and Ti/Pt/Au was thicker than 50 angstrom, which is about one-fourth of the conventional Ti/Pt/Au contact. The activation energies of the initial degradation of the Pt/Ti/Pt/Au electrodes correspond to the reaction of GaAs and Pt to form PtAs2. However, even after the initial degradation, Pt/Ti/Pt/Au with the thin Pt interface layer still shows lower contact resistivity. These systems are promising for practical p-type ohmic contacts for AlGaAs/GaAs heterojunction bipolar transistors.
- リンク情報
- ID情報
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- ISSN : 0021-4922
- Web of Science ID : WOS:A1991FF64300008