論文

査読有り
1991年4月

ELECTRICAL CHARACTERISTICS AND RELIABILITY OF PT/TI/PT/AU OHMIC CONTACTS TO P-TYPE GAAS

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
  • H OKADA
  • ,
  • S SHIKATA
  • ,
  • H HAYASHI

30
4A
開始ページ
L558
終了ページ
L560
記述言語
英語
掲載種別
研究論文(学術雑誌)
出版者・発行元
JAPAN J APPLIED PHYSICS

The ohmic contacts to p-type GaAs formed by GaAs/Pt/Ti/Pt/Au systems were investigated. The specific contact resistance below 8 x 10(-7) OMEGA.cm2 was achieved when the interface Pt between GaAs and Ti/Pt/Au was thicker than 50 angstrom, which is about one-fourth of the conventional Ti/Pt/Au contact. The activation energies of the initial degradation of the Pt/Ti/Pt/Au electrodes correspond to the reaction of GaAs and Pt to form PtAs2. However, even after the initial degradation, Pt/Ti/Pt/Au with the thin Pt interface layer still shows lower contact resistivity. These systems are promising for practical p-type ohmic contacts for AlGaAs/GaAs heterojunction bipolar transistors.

リンク情報
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:A1991FF64300008&DestApp=WOS_CPL
ID情報
  • ISSN : 0021-4922
  • Web of Science ID : WOS:A1991FF64300008

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