Toshio Goto

Profile Information

Affiliation: Director in General of Institute of Science and Tecnology, Chubu University

Degree: 工学博士

J-GLOBAL ID: 200901068761960832
researchmap Member ID: 1000023934

Research Interests

Research Areas

Manufacturing technology (mechanical, electrical/electronic, chemical engineering) / Electronic devices and equipment /
Nanotechnology/Materials / Optical engineering and photonics /
Nanotechnology/Materials / Thin-film surfaces and interfaces /

Research History

2004 - 2005

Nagoya University, Nagoya University
2005

- 中部大学総合工学研究所長
2003 - 2004

Nagoya University
2000 - 2003

名古屋大学工学研究科長・工学部長、評議員
2003

- 日本学術会議第５部会員
1996 - 1998

名古屋大学ベンチャービジネスラボラトリー長
1994 - 1996

Nagoya University
1986 - 1995

名古屋大学工学部電子工学科教授
1995

- 名古屋大学工学研究科量子工学専攻教授
1992 - 1994

School of Engineering, Nagoya University
1974 - 1986

同講師、助教授
1969 - 1974

名古屋大学工学部電子工学科助手

Committee Memberships

Awards

2003

応用物理学会プラズマエレクトロニクス賞
2003

応用物理学会論文賞
2002

Institute of Physics Fellow Award
2002

日本工学教育協会賞（業績賞）
2002

IEEE Fellow Award
2001

Int. Microprocesses and Nanotechnology Conference 2000 Paper Award
2001

International Biographical Center's 21st Award for Achievement
2001

レーザー学会業績賞（進歩賞）
1993

レーザー学会業績賞（論文賞）

Misc.

1196

Silicon-oxide etching process employing an electron-beam-excited plasma

M Ito, K Takeda, T Shiina, Y Okamura, H Nagai, M Hori, T Goto

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 22(2) 543-547, Mar, 2004
Silicon-oxide etching process employing an electron-beam-excited plasma

M Ito, K Takeda, T Shiina, Y Okamura, H Nagai, M Hori, T Goto

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 22(2) 543-547, Mar, 2004
Effects of driving frequency on the translational temperature and absolute density of Si atoms in very high frequency capacitively coupled SiF4 plasmas

T Ohta, M Hori, T Ishida, T Goto, M Ito, S Kawakami, N Ishii

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 42(12B) L1532-L1534, Dec, 2003
Effects of driving frequency on the translational temperature and absolute density of Si atoms in very high frequency capacitively coupled SiF4 plasmas

T Ohta, M Hori, T Ishida, T Goto, M Ito, S Kawakami, N Ishii

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 42(12B) L1532-L1534, Dec, 2003
Generation of squeezed vacuum using spectral filter by spatial light modulator and nonlinear polarization interferometer

J Higuchi, N Nishizawa, M Mori, R Goto, K Yamane, T Goto

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 42(8) 5048-5051, Aug, 2003
Etching organic low dielectric film in ultrahigh frequency plasma using N-2/H-2 and N-2/NH3 gases

H Nagai, M Hiramatsu, M Hori, T Goto

JOURNAL OF APPLIED PHYSICS, 94(3) 1362-1367, Aug, 2003
Measurement of Si, SiF, and SiF2 radicals and SiF4 molecule using very high frequency capacitively coupled plasma employing SiF4

T Ohta, K Hara, T Ishida, M Hori, T Goto, M Ito, S Kawakami, N Ishii

JOURNAL OF APPLIED PHYSICS, 94(3) 1428-1435, Aug, 2003
Generation of squeezed vacuum using spectral filter by spatial light modulator and nonlinear polarization interferometer

J Higuchi, N Nishizawa, M Mori, R Goto, K Yamane, T Goto

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 42(8) 5048-5051, Aug, 2003
Etching organic low dielectric film in ultrahigh frequency plasma using N-2/H-2 and N-2/NH3 gases

H Nagai, M Hiramatsu, M Hori, T Goto

JOURNAL OF APPLIED PHYSICS, 94(3) 1362-1367, Aug, 2003
Measurement of Si, SiF, and SiF2 radicals and SiF4 molecule using very high frequency capacitively coupled plasma employing SiF4

T Ohta, K Hara, T Ishida, M Hori, T Goto, M Ito, S Kawakami, N Ishii

JOURNAL OF APPLIED PHYSICS, 94(3) 1428-1435, Aug, 2003
Measurement of oxygen atom density employing vacuum ultraviolet absorption spectroscopy with microdischarge hollow cathode lamp

H Nagai, M Hiramatsu, M Hori, T Goto

REVIEW OF SCIENTIFIC INSTRUMENTS, 74(7) 3453-3459, Jul, 2003
Measurement of oxygen atom density employing vacuum ultraviolet absorption spectroscopy with microdischarge hollow cathode lamp

H Nagai, M Hiramatsu, M Hori, T Goto

REVIEW OF SCIENTIFIC INSTRUMENTS, 74(7) 3453-3459, Jul, 2003
Fabrication of multilayered SiOCH films with low dielectric constant employing layer-by-layer process of plasma enhanced chemical vapor deposition and oxidation

H Nagai, M Hori, T Goto, T Fujii, M Hiramatsu

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 42(5A) 2775-2779, May, 2003
Fabrication of multilayered SiOCH films with low dielectric constant employing layer-by-layer process of plasma enhanced chemical vapor deposition and oxidation

H Nagai, M Hori, T Goto, T Fujii, M Hiramatsu

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 42(5A) 2775-2779, May, 2003
Measurement of C-2 radical density in microwave methane/hydrogen plasma used for nanocrystalline diamond film formation

M Hiramatsu, K Kato, CH Lau, JS Foord, M Hori

DIAMOND AND RELATED MATERIALS, 12(3-7) 365-368, Mar, 2003
Effects of oxygen and nitrogen atoms on SiOCH film etching in ultrahigh-frequency plasma

H Nagai, Y Maeda, M Hiramatsu, M Hori, T Goto

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 42(3B) L326-L328, Mar, 2003
Plasma induced subsurface reactions for anisotropic etching of organic low dielectric film employing N-2 and H-2 gas chemistry

H Nagai, M Hiramatsu, M Hori, T Goto

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 42(3A) L212-L214, Mar, 2003
Measurement of C-2 radical density in microwave methane/hydrogen plasma used for nanocrystalline diamond film formation

M Hiramatsu, K Kato, CH Lau, JS Foord, M Hori

DIAMOND AND RELATED MATERIALS, 12(3-7) 365-368, Mar, 2003
Effects of oxygen and nitrogen atoms on SiOCH film etching in ultrahigh-frequency plasma

H Nagai, Y Maeda, M Hiramatsu, M Hori, T Goto

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 42(3B) L326-L328, Mar, 2003
Plasma induced subsurface reactions for anisotropic etching of organic low dielectric film employing N-2 and H-2 gas chemistry

H Nagai, M Hiramatsu, M Hori, T Goto

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 42(3A) L212-L214, Mar, 2003

Books and Other Publications

応用物理学用語辞典

(株)オーム社, 1998
量子エレクトロニクス

(株)昭晃堂, 1998
フリーラジカルの科学

(株)学会出版センター, 1998
物質(もの)とはその機能と変換

第11回「大学と科学」公開シンポジウム組織委員会, 1997
検証:災害とは何か

(株)リバティ書房, 1997
半導体レーザによる気相中ラジカルの測定

IONIC, 1994
Measurements of Radicals in Gas Phase Using Semiconductor Lasers

IONIC, 1994
Density Measurements of Excited Atoms in Ne/Ar/F2 and He/Ar/F2 Mixtures Excited by Discharge

ISLOE 93 Proc., 1993
Time Resolved Density Measurements of Excited Components in an ArF Excimer Laser

Proc. CLEO, 1993
電気磁気学

(株)昭晃堂, 1993
Density Measurements of Excited Atoms in Ne/Ar/F2 and He/Ar/F2 Mixtures Excited by Discharge

ISLOE 93 Proc., 1993
Time Resolved Density Measurements of Excited Components in an ArF Excimer Laser

Proc. CLEO, 1993
プラズマ材料科学ハンドブック

オーム社, 1992
光エレクトロニクス事典

(株)産業調査会事典出版センター, 1992
プラズマ材料科学ハンドブック

(株)オーム社, 1992
Handbook for Plasma Material Sciences

1992

Profile Information

Research Interests

Research Areas

Research History

Committee Memberships

Awards

Misc.

Books and Other Publications

Professional Memberships

Research Projects

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