論文

査読有り
2016年6月

Evaluation of Autologous Fascia Implantation With Controlled Release of Fibroblast Growth Factor for Recurrent Laryngeal Nerve Paralysis Due to Long-term Denervation

ANNALS OF OTOLOGY RHINOLOGY AND LARYNGOLOGY
  • Hiromi Nagai
  • ,
  • Koichiro Nishiyama
  • ,
  • Yutomo Seino
  • ,
  • Yasuhiko Tabata
  • ,
  • Makito Okamoto

125
6
開始ページ
508
終了ページ
515
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1177/0003489415625075
出版者・発行元
SAGE PUBLICATIONS INC

Objectives: Paralyzed tissue due to long-term denervation is resistant to many treatments because it induces irreversible histological changes and disorders of deglutition or phonation. We sought to determine the effect of autologous transplantation of fascia into the vocal fold (ATFV) with controlled release of basic fibroblast growth factor (bFGF) on long-term unilateral vocal fold paralysis (UVFP).
Methods: Unilateral recurrent laryngeal nerve (RLN) section was performed on 20 rats. Five rats were implanted with autologous fascia only (fascia group), and 10 rats were implanted with autologous fascia and a gelatin hydrogel sheet with 1 g (1 g bFGF + fascia group) or 0.1 g (0.1 g bFGF + fascia group) of bFGF 4 months after RLN section. We evaluated the normalized glottal gap and laryngeal volume and histological changes 3 months after implantation.
Results: The normalized glottal gap was significantly reduced in the 3 fascia implantation groups. Normalized laryngeal volume, fat volume, and lateral thyroarytenoid muscle volume were significantly increased in the 2 fascia implantation with bFGF groups.
Conclusions: The ATFV with controlled release of bFGF repaired the glottal gap and laryngeal volume after RLN section and may reduce the occurrence of aspiration and hoarseness. We speculate that this treatment improves laryngeal function in long-term RLN denervation.

リンク情報
DOI
https://doi.org/10.1177/0003489415625075
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000375836600010&DestApp=WOS_CPL
ID情報
  • DOI : 10.1177/0003489415625075
  • ISSN : 0003-4894
  • eISSN : 1943-572X
  • Web of Science ID : WOS:000375836600010

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