2004年2月
Contraction and reexpansion of polymer thin films
PHYSICAL REVIEW E
- ,
- ,
- 巻
- 69
- 号
- 2
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1103/PhysRevE.69.022801
- 出版者・発行元
- AMER PHYSICAL SOC
We report x-ray reflectivity measurements on polystyrene thin films supported on silicon wafer. In annealing experiments, we found fast and slow contraction processes in the thin films above the glass transition temperature. The former is the normal relaxation (annealing) process observed in bulk, and the latter is unexpected and enhanced in thin films below similar to20 nm. In addition, we found unexpected extremely slow reexpansion processes in the glassy state. These unexpected very slow processes are discussed in terms of lateral contraction and expansion processes driven by entropic changes at the interfaces and the difference of the expansivities between polystyrene and silicon wafer.
- リンク情報
- ID情報
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- DOI : 10.1103/PhysRevE.69.022801
- ISSN : 1539-3755
- Web of Science ID : WOS:000220255400086