2003年7月15日
Effect of uniaxial stress on photoluminescence in GaN and stimulated emission in InxGa1-xN/GaN multiple quantum wells
Physical Review B - Condensed Matter and Materials Physics
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- 巻
- 68
- 号
- 11
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1103/PhysRevB.68.035328
Photoluminescence and stimulated emission (SE) in a wurtzite GaN bulk crystal and InxGa1-xN/GaN multiple quantum wells (MQW’s) are investigated under uniaxial stress applied perpendicularly to the c axis. The strain in GaN induces a decrease in the photoluminescence intensity of B excitons relative to A excitons due to an increase in the energy splitting between the two states. In InxGa1−xN/GaN MQW’s, SE and optical gain in the localized states are observed at 6 K under low excitation power below the Mott density of excitons. The uniaxial stress induces a low-energy shift of the gain peak and a decrease in the threshold carrier density of SE. In the excitation power above the Mott density, the SE arises from an electron-hole plasma recombination. The gain value at 0.43 GPa is 1.34 times as large as that without stress at 6 K, which is comparable with a theoretical estimation. The observed effects of strain are ascribed to a decrease in the density of states at the valance-band maximum. © 2003 The American Physical Society.
- ID情報
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- DOI : 10.1103/PhysRevB.68.035328
- ISSN : 1550-235X
- ISSN : 1098-0121
- SCOPUS ID : 85038980740