GOTOH Yasuhito

J-GLOBAL         Last updated: Sep 15, 2015 at 15:37
 
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Name
GOTOH Yasuhito
Affiliation
Kyoto University
Section
Graduate School of Engineering, Department of Electronic Science and Engineering
Job title
Associate Professor
Degree
Master of Engineering(Kyoto University), Doctor (Engineering)(Kyoto University)

Research Areas

 
 

Academic & Professional Experience

 
1987
 - 
1990
Toyota Central Research and Development Inc. Division 6
 
1990
 - 
1995
Kyoto University, Facclty of Engineering, Instructor
 
1995
 - 
2003
Kyoto University, Graduate School of Engineering, Instructor
 
2004
   
 
- Kyoto University, Graduate School of Engineering, Associate Professor
 

Education

 
 
 - 
1987
Graduate School, Division of Engineering, Kyoto University
 
 
 - 
1985
Faculty of Engineering, Kyoto University
 

Committee Memberships

 
2000
 - 
2003
Japan Society of Applied Physics  Program Committee
 

Awards & Honors

 
2000
The Best Oral Presentation Award, Second Prize, at the 13th International Vacuum Microelectronics Conference
 

Published Papers

 
IMPREGNATED-ELECTRODE-TYPE LIQUID METAL ION SOURCE (VI) - CHARACTERISTICS OF Au-Sb ALLOY ION SOURCE.
Yasuhito Gotoh; Toshio Kashiwagi; Hiroshi Tsuji; Junzo Ishikawa; Toshinori Takagi
19-26   1986   [Refereed]
J. Ishikawa; Y. Gotoh; H. Tsuji; T. Takagi
Nuclear Inst. and Methods in Physics Research, B   21(1-4) 186-189   1987   [Refereed]
Y. Gotoh; Y. Taga
Journal of Applied Physics   67(2) 1030-1036   1990   [Refereed]
Role of kinetic energy of sputtered particles in thinfilm formation
Y. Taga; Y. Gotoh
Thin Solid Films   193-194(PART 1) 164-170   1990   [Refereed]
J. Ishikawa; H. Tsuji; Y. Gotoh
Nuclear Inst. and Methods in Physics Research, B   55(1-4) 343-347   1991   [Refereed]

Misc

 
Particle-scattering phenomenon of powders caused by charging voltage of the surface during ion implantation
Junzo Ishikawa; Hiroshi Tsuji; Yasuhito Gotoh
Proceedings of the International Conference on Ion Implantation Technology   249-252   1996   [Refereed]
Molecular ion implantation technique for obtaining the same depth profile for the component atoms
Junzo Ishikawa; Hiroshi Tsuji; Masakazu Mimura; Yasuhito Gotoh
Proceedings of the International Conference on Ion Implantation Technology   776-779   1996   [Refereed]
Negative-ion production of reactive elements from compound gases in the RF plasma-sputter-type heavy negative-ion source
Hiroshi Tsuji; Junzo Ishikawa; Tetsuo Tomita; Yasuhito Gotoh
Proceedings of the International Conference on Ion Implantation Technology   334-337   1996   [Refereed]
Miniaturized liquid gallium field emission electron sources for vacuum microelectronics
J. Ishikawa; Y. Gotoh; N. Fujita; S. Nishikawa; H. Tsuji
Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC   34-38   1996   [Refereed]
Influence of the composition of NbNx thin film field emitter array on the emission characteristics
M. Nagao; T. Ura; Y. Gotoh; H. Tsuji; J. Ishikawa
Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC   306-307   1998   [Refereed]

Research Grants & Projects

 
Development of Field Emission Ion/Electron Sources
Deposition of Thin Fims for Electrodes