1996年7月
Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials
APPLIED SURFACE SCIENCE
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- 巻
- 100
- 号
- 開始ページ
- 342
- 終了ページ
- 346
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1016/0169-4332(96)00238-3
- 出版者・発行元
- ELSEVIER SCIENCE BV
The scattering of powder particles is caused by charging in the ion implantation of positive ions into dielectric powders without a charge compensation, this makes dose control difficult. We have studied the particle-scattering phenomenon in ion implantation into spherical powders both theoretically and experimentally. Taking into account Coulomb force, Van der Waals force and a gravity working on a sphere, the force balance equation was driven to give the threshold charging voltage above which the charged sphere begins to be scattered. In positive-argon-ion implantation into three oxide powders at an average size of 5, 115 and 425 mu m, particle-scattering was observed above each ion-acceleration voltage (i.e., charging voltage) of 6.5, 1.0 and 2.7 kV, respectively. These voltages were in good agreement with the predicted threshold charging voltages. Conversely, in the negative-carbon-ion implantation, on the contrary, there was no scattering for all samples even at an ion acceleration voltage of 20 kV. The negative-ion implantation technique was found to be a non-scattering implantation method for powders.
- リンク情報
- ID情報
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- DOI : 10.1016/0169-4332(96)00238-3
- ISSN : 0169-4332
- J-Global ID : 200902129764006245
- Web of Science ID : WOS:A1996VD64000072