論文

査読有り
2003年7月

Measurement of work function of transition metal nitride and carbide thin films

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
  • Y Gotoh
  • ,
  • H Tsuji
  • ,
  • J Ishikawa

21
4
開始ページ
1607
終了ページ
1611
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1116/1.1591749
出版者・発行元
A V S AMER INST PHYSICS

Work functions of transition metal nitride and carbide thin films were measured. The materials investigated were ZrN, NbN, HfN, TaN, HfC, and TaC. The films were prepared either by radio-frequency magnetron sputter deposition or by ion beam assisted deposition. The work function was measured by Kelvin probe in air. The work functions of ZrN and HfN ranged between 4.6 and 4.7 eV, and were similar to or slightly lower than that of NbN and TaN, 4.7 or 4.8 eV. The work function of TaC was approximately 5.0 eV. The higher work function of carbide may be attributed to lower electronegativity of carbon as compared to nitrogen. (C) 2003 American Vacuum Society.

リンク情報
DOI
https://doi.org/10.1116/1.1591749
J-GLOBAL
https://jglobal.jst.go.jp/detail?JGLOBAL_ID=200902298011930515
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000185080000076&DestApp=WOS_CPL
ID情報
  • DOI : 10.1116/1.1591749
  • ISSN : 1071-1023
  • J-Global ID : 200902298011930515
  • Web of Science ID : WOS:000185080000076

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