2003年7月
Measurement of work function of transition metal nitride and carbide thin films
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
- ,
- ,
- 巻
- 21
- 号
- 4
- 開始ページ
- 1607
- 終了ページ
- 1611
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1116/1.1591749
- 出版者・発行元
- A V S AMER INST PHYSICS
Work functions of transition metal nitride and carbide thin films were measured. The materials investigated were ZrN, NbN, HfN, TaN, HfC, and TaC. The films were prepared either by radio-frequency magnetron sputter deposition or by ion beam assisted deposition. The work function was measured by Kelvin probe in air. The work functions of ZrN and HfN ranged between 4.6 and 4.7 eV, and were similar to or slightly lower than that of NbN and TaN, 4.7 or 4.8 eV. The work function of TaC was approximately 5.0 eV. The higher work function of carbide may be attributed to lower electronegativity of carbon as compared to nitrogen. (C) 2003 American Vacuum Society.
- リンク情報
- ID情報
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- DOI : 10.1116/1.1591749
- ISSN : 1071-1023
- J-Global ID : 200902298011930515
- Web of Science ID : WOS:000185080000076