論文

査読有り
1994年12月

FABRICATION OF CONE-SHAPED METAL-INSULATOR-SEMICONDUCTOR ELECTRON-TUNNELING CATHODE

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
  • INOUE, K
  • ,
  • GOTOH, Y
  • ,
  • TSUJI, H
  • ,
  • ISHIKAWA, J

33
12B
開始ページ
7176
終了ページ
7179
記述言語
英語
掲載種別
DOI
10.1143/JJAP.33.7176
出版者・発行元
社団法人応用物理学会

A new cone-shaped metal-insulator-semiconductor (MIS) cathode with an outside electrode is proposed for vacuum microelectronics devices. This cathode has larger emission current and higher transfer ratio (the ratio of electron emission current to the diode current) than those of the conventional MIS cathodes. In the present paper, the general concept of this new cathode is presented. To ensure the effectiveness of the electrode configuration, the cathode performance was investigated with a cone-shaped MIS cathode. The fundamental characteristics of this cathode were measured. The emission into vacuum was confirmed and the transfer ratio of about 10-3 at maximum was obtained.

リンク情報
DOI
https://doi.org/10.1143/JJAP.33.7176
J-GLOBAL
https://jglobal.jst.go.jp/detail?JGLOBAL_ID=200902181353699977
CiNii Articles
http://ci.nii.ac.jp/naid/110003946676
CiNii Books
http://ci.nii.ac.jp/ncid/AA10457675
ID情報
  • DOI : 10.1143/JJAP.33.7176
  • ISSN : 0021-4922
  • J-Global ID : 200902181353699977
  • CiNii Articles ID : 110003946676
  • CiNii Books ID : AA10457675

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