KAKIUCHI Hiroaki

J-GLOBAL         Last updated: Aug 25, 2011 at 00:00
 
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Name
KAKIUCHI Hiroaki
Affiliation
Osaka University
Section
Graduate School of Engineering, Division of Precision Science & Technology and Applied Physics
Job title
associate professor
Degree
master of Engineering(Osaka University), Doctor of Engineering(Osaka University)

Research Areas

 
 

Academic & Professional Experience

 
1991
 - 
2001
Osaka University, Research Associate
 
2001
   
 
- Osaka University, Associate Proffesor
 

Education

 
 
 - 
1991
Graduate School, Division of Engineering, Osaka University
 
 
 - 
1989
Department of Precision Engineering, Faculty of Engineering, Osaka University
 

Misc

 
Plasma CVM (Chemical Vaporization Machining) - An Precision Machining with High Pressure Reactive Plasma-
TECHNOLOGY RERORTS OF THE OSAKA UNIVERSITY   43(2156) 261-266   1993
Journal of Magnetism and Magnetic Materials   126(22-24)    1993
Surface Recombination Velocities and Interface State Parameters at Si-SiO2 Interface Prepared by Low Temperature Plasma Processes
Technical Digest of the International PVSEC-7   549-550    1993
Yoshifumi SUZAKI, Shigeaki NAKAMURA, Hiroaki KAKIUCHI, Kumayasu YOSHII, Hideaki KAWABE
Journal of the Japan Society for Precision Engineering   60(1) 138-142   1994
Yoshifumi SUZAKI, Tomokazu SHIKAMA, Hiroaki KAKIUCHI, Kumayasu YOSHII, Hideaki KAWABE
Journal of the Japan Soceity for Precision Engineering   60(3) 393-396   1994

Books etc

 
Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
Proceedings of the 7th International Precision Engineering Seminar.   1993   
Plasma CVM (Chemical Vapor Machining) - A Chemical Machining Method with Equal Performance to Conventional Mechanical Methods from the sence of Removal Rates and Spatial Resolutions
Proceedings of the 7th International Precision Engineering Seminar.   1993   
High-rate deposition of amorphous silicon films by atmospheric pressure plasma chemical vapor deposition
Crystal Growth Technology, Edited by H. J. Scheel and T. Fukuda, John Wiley & Sons Ltd   2003   

Works

 
Center of Excellence for Atomically Controlled Fabrication Technology
2008

Research Grants & Projects

 
Low temperature and high-rate deposition of functional materials
The Other Research Programs
Diagnostics and controle of plasma
The Other Research Programs