MISC

2000年2月

A simple VLSI spherical particle-induced fault simulator: application to DRAM production process

MICROELECTRONICS RELIABILITY
  • K Nakamae
  • ,
  • H Ohmori
  • ,
  • H Fujioka

40
2
開始ページ
245
終了ページ
253
記述言語
英語
掲載種別
DOI
10.1016/S0026-2714(99)00228-0
出版者・発行元
PERGAMON-ELSEVIER SCIENCE LTD

A simple VLSI particle-induced fault simulator has been proposed where the mappings of the effect of particles to defects or to faults are modeled. The simulator allows us to predict the entire yield of VLSI and also to analyze the bottleneck processing step and faults. In the simulator, particles with spherical shape are generated in the production equipment for each VLSI processing step and are deposited on the wafer. The simulator accepts as inputs (a) layout description of the VLSI design under analysis in GDS II format, (b) production flow data, (c) planned layer thickness data, and (d) particle parameters for each production equipment. The predictor was applied to a 16-Mbit DRAM production process to show its validity. (C) 1999 ACRS. Published by Elsevier Science Ltd. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/S0026-2714(99)00228-0
CiNii Articles
http://ci.nii.ac.jp/naid/10010442690
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000085743200004&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/S0026-2714(99)00228-0
  • ISSN : 0026-2714
  • CiNii Articles ID : 10010442690
  • Web of Science ID : WOS:000085743200004

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