2003年12月
Enhancing effect of tensile strain on photoluminescence of Er in Si on a SiGe layer
PHYSICA B-CONDENSED MATTER
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- 巻
- 340
- 号
- 開始ページ
- 818
- 終了ページ
- 822
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1016/j.physb.2003.09.225
- 出版者・発行元
- ELSEVIER SCIENCE BV
We studied on the effect of the strain on photoluminescence (PL) properties of Er-doped Si on a SiGe layer (Si:Er:O/SiGe) and Er-doped SiGe on a Si layer (SiGe:Er:O/Si) grown by molecular beam epitaxy. Er-related luminescence was observed around 1.54 mum in all the samples. The PL spectra of the Si:Er:O/SiGe samples are much broader and stronger than those of the Si:Er:O/Si samples prepared as reference. Moreover, the intensive luminescence was observed in the Si:Er:O/SiGe sample that had much lower Er concentration of about 2.5 x 10(16) cm(-3). On the other hand, the significant differences in the PL spectra between the SiGe:Er:O/Si and Si:Er:O/Si samples were not observed. These indicate that the tensile strained Si enhances the optical activation of Er. (C) 2003 Elsevier B.V. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1016/j.physb.2003.09.225
- ISSN : 0921-4526
- Web of Science ID : WOS:000188300200171