Papers

Peer-reviewed
Jul, 2008

High-performance C(60) thin-film field-effect transistors with parylene gate insulator

APPLIED PHYSICS LETTERS
  • Yoshihiro Kubozono
  • ,
  • Simon Haas
  • ,
  • Wolfgang L. Kalb
  • ,
  • Pierre Joris
  • ,
  • Fabian Meng
  • ,
  • Akihiko Fujiwara
  • ,
  • Bertram Batlogg

Volume
93
Number
3
First page
033316
Last page
Language
English
Publishing type
Research paper (scientific journal)
DOI
10.1063/1.2959819
Publisher
AMER INST PHYSICS

C(60) field-effect transistors (FETs) have been fabricated with parylene gate dielectric on Si/SiO(2), on polyethylene terephthalate, and commercially available transparent sheet substrates. The best performance of the C(60) FET device is achieved with parylene as gate dielectric: field-effect mobility of 0.41 cm(2) V(-1) s(-1) and on-off ratio of similar to 10(7). The excellent FET characteristics are recorded without any annealing, and the devices were kept in He atmosphere after an exposure to air. This result suggests the parylene gate dielectric to be highly H(2)O repellent. The mechanical flexibility and air-exposure effect were studied for the C(60) FET with parylene gate dielectric. (C) 2008 American Institute of Physics.

Link information
DOI
https://doi.org/10.1063/1.2959819
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000257968700091&DestApp=WOS_CPL
ID information
  • DOI : 10.1063/1.2959819
  • ISSN : 0003-6951
  • Web of Science ID : WOS:000257968700091

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