論文

査読有り
2004年4月

Fabrication and characteristics of C-84 fullerene field-effect transistors

APPLIED PHYSICS LETTERS
  • K Shibata
  • ,
  • Y Kubozono
  • ,
  • T Kanbara
  • ,
  • T Hosokawa
  • ,
  • A Fujiwara
  • ,
  • Y Ito
  • ,
  • H Shinohara

84
14
開始ページ
2572
終了ページ
2574
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1063/1.1695193
出版者・発行元
AMER INST PHYSICS

Fullerene field-effect transistors (FETs) were fabricated with thin films of C-84, which showed n-channel normally-on depletion-type FET characteristics. The C-84 FET device exhibited the highest mobility, mu, of 2.1x10(-3) cm(2) V-1 s(-1) among normally-on fullerene FETs. The carrier transport of this FET device can be interpreted as thermally activated hopping transport. Carrier type (n-channel) and transport mechanism (hopping) reflect the electronic properties of the C-84 molecule. (C) 2004 American Institute of Physics.

リンク情報
DOI
https://doi.org/10.1063/1.1695193
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000220586800034&DestApp=WOS_CPL
ID情報
  • DOI : 10.1063/1.1695193
  • ISSN : 0003-6951
  • Web of Science ID : WOS:000220586800034

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