1999年8月
Critical parameters in the sputter-deposition of NdBa2Cu3O7-delta thin films
SUPERCONDUCTOR SCIENCE & TECHNOLOGY
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- 巻
- 12
- 号
- 8
- 開始ページ
- 481
- 終了ページ
- 485
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1088/0953-2048/12/8/302
- 出版者・発行元
- IOP PUBLISHING LTD
A superconducting thin film of NdBa2Cu3O7-delta (NBCO) was prepared on an MgO(100) substrate by de magnetron sputtering. Superconducting properties as well as features such as resistivity at room temperature and surface morphology were improved by optimizing the composition of sputtering target and critical parameters such as substrate temperature and oxidation gas pressure. A highly c-axis oriented thin film with T-c (zero resistance temperature) = 95.2 K was obtained reproducibly with NdBa2Cu3.2O7-delta off-stoichiometric target sputtering. T-c = 95.2 K was 8 K higher than that deposited by stoichiometric target sputtering. Critical current density was 1 x 10(6) A cm(-2) at 77 K, and surface roughness was 35 nm.
- リンク情報
- ID情報
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- DOI : 10.1088/0953-2048/12/8/302
- ISSN : 0953-2048
- Web of Science ID : WOS:000082291000003