MISC

1999年8月

Critical parameters in the sputter-deposition of NdBa2Cu3O7-delta thin films

SUPERCONDUCTOR SCIENCE & TECHNOLOGY
  • Y Hakuraku
  • ,
  • Z Mori
  • ,
  • S Koba
  • ,
  • N Yokoyama
  • ,
  • T Doi
  • ,
  • T Inoue

12
8
開始ページ
481
終了ページ
485
記述言語
英語
掲載種別
DOI
10.1088/0953-2048/12/8/302
出版者・発行元
IOP PUBLISHING LTD

A superconducting thin film of NdBa2Cu3O7-delta (NBCO) was prepared on an MgO(100) substrate by de magnetron sputtering. Superconducting properties as well as features such as resistivity at room temperature and surface morphology were improved by optimizing the composition of sputtering target and critical parameters such as substrate temperature and oxidation gas pressure. A highly c-axis oriented thin film with T-c (zero resistance temperature) = 95.2 K was obtained reproducibly with NdBa2Cu3.2O7-delta off-stoichiometric target sputtering. T-c = 95.2 K was 8 K higher than that deposited by stoichiometric target sputtering. Critical current density was 1 x 10(6) A cm(-2) at 77 K, and surface roughness was 35 nm.

リンク情報
DOI
https://doi.org/10.1088/0953-2048/12/8/302
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000082291000003&DestApp=WOS_CPL
ID情報
  • DOI : 10.1088/0953-2048/12/8/302
  • ISSN : 0953-2048
  • Web of Science ID : WOS:000082291000003

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