谷本久典 (Hisanori Tanimoto) - 論文

Inhibition of Electropulsing Nanocrystallization in Amorphous ZrCu under Helium Atmosphere

Tanimoto, Hisanori, Keisuke, Takeuchi, Tessei, Ikegami, Toshiki, Okazaki

MATERIALS TRANSACTIONS 61(5) 878 - 883 2020年4月査読有り

Visible-Light-Assisted Silver Ion Reduction through Silver Diammine and Citrate Aggregation, and Silver Nanoparticle Formation

Hashiguchi, Kazuhiro, Kamiya, Masashi, Tanimoto, Hisanori

MATERIALS TRANSACTIONS 59(4) 648 - 655 2018年査読有り

Low-Temperature anelastic property of nanocrystalline ag fabricated by gas deposition method

Terigele Xi, Ryoma Suzuki, Hisanori Tanimoto

Materials Research 21(2) e20170883 2018年査読有り

Glass-Transition-Like Behavior of Grain Boundaries in Nanocrystalline Gold

Xi, Terigele, Sato, Takahiro, Suzuki, Ryoma, Tanimoto, Hisanori

MATERIALS TRANSACTIONS 59(1) 47 - 52 2017年査読有り

Growth Inhibition of Hexagonal Silver Nanoplates by Localized Surface Plasmon Resonance

Hisanori Tanimoto, Kazuhiro Hashiguchi, Satoru Ohmura

JOURNAL OF PHYSICAL CHEMISTRY C 119(33) 19318 - 19325 2015年8月査読有り

Light-induced hydrogen evolution from hydrogenated amorphous silicon: Hydrogen diffusion by formation of bond centered hydrogen

H. Tanimoto, H. Arai, H. Mizubayashi, M. Yamanaka, I. Sakata

JOURNAL OF APPLIED PHYSICS 115(7) 073503 2014年2月

単色可視光照射によるサイズ選択的六角板銀ナノ粒子の創成 ─光励起場を利用した金属ナノ粒子の形態制御に向けて─

谷本, 久典

Materia Japan 53(11) 537 - 540 2014年

Solvent Design Methodology to Recycle Chamber Parts and Recover Platinum by Highly Selective Wet Treatment for Ni-Pt Sputtering System

Takuya Futase, Yoshichika Sabae, Hisanori Tanimoto

JAPANESE JOURNAL OF APPLIED PHYSICS 52(11) 116505 - 116505-5 2013年11月

Fluoride Contamination Induced NiSi2 Film Formation in a Gate NiSi Line

Takuya Futase, Hisanori Tanimoto

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 26(3) 355 - 360 2013年8月

Stress-induced voiding in nickel silicide

Takuya Futase, Toshiyuki Oashi, Hitoshi Maeda, Yutaka Inaba, Hisanori Tanimoto

MICROELECTRONIC ENGINEERING 106 116 - 120 2013年6月

Size-Selective Formation of Hexagonal Silver Nanoprisms in Silver Citrate Solution by Monochromatic-Visible-Light Irradiation

Hisanori Tanimoto, Satoru Ohmura, Yoshitaka Maeda

JOURNAL OF PHYSICAL CHEMISTRY C 116(29) 15819 - 15825 2012年7月査読有り

Uniform, Low-Resistive Ni-Pt Silicide Fabricated by Partial Conversion With Low Metal-Consumption Ratio

Takuya Futase, Takeshi Kamino, Yutaka Inaba, Hisanori Tanimoto

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 24(4) 545 - 551 2011年11月査読有り

Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film

Takuya Futase, Hisanori Tanioto, Mitsuo Kimoto, Hideaki Tsugane, Hidenori Suzuki, Hiroshi Tobimatsu

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 29(5) 2011年9月査読有り

Probable Carrier Localization in Nanoporous Gold Prepared by Se-lective Etching

H., Tanimoto, T., Shintani, H, Mizubayashi

Proc. 7th Int. Conf. 7th International Conference on Porous Metals and Metallic Foams (MetFoam), Busan, Korea 655-660 2011年9月査読有り

23aGQ-7 ナノ構造系金属におけるパルス通電による格子励起と構造緩和(23aGQ 格子欠陥・ナノ構造(炭素ナノ材料・ダイナミクス),領域10(誘電体,格子欠陥,X線・粒子線,フォノン))

谷本, 久典, 曽我, 陽介, 茂木, 卓也, 水林, 博

日本物理学会講演概要集 66(2) 998 2011年8月

Dissolved-Oxygen-Induced Intensive Pitting Corrosion of Amorphous ZrCu Alloys in Thin NaCl Solutions

Hisanori Tanimoto, Yosuke Soga, Yoshinobu Takayanagi, Hiroshi Mizubayashi

MATERIALS TRANSACTIONS 52(7) 1402 - 1409 2011年7月査読有り

Partial conversion as a first silicidation process to fabricate low-resistive and low-leakage nickel silicide film in advanced CMOSs

T., Futase, T., Kamino, Y., Inaba, and, H. Tanimoto, 谷本, 久典

Proc. 11th IEEE Int. Workshop Junction Technol. (IWJT), Kyoto, Japan 55-60 2011年6月査読有り

TiCl4 Soak on NiSi: Selective Formation of Pure Sub-Nanometer NiTi to Reduce Contact Resistance

Takuya Futase, Naoto Hashikawa, Hirohiko Yamamoto, Hisanori Tanimoto

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 24(2) 325 - 332 2011年5月査読有り

Stress-induced voids in nickel silicide: Disconnection of Narrow (Ni-Pt)Si between Gate Canyons on Wide Active Area

T., Futase, Toshiyuki, Oashi, Hitoshi, Maeda, Yutaka, Inaba, and, Hisanori Tanimoto, 谷本, 久典

Proc. 2011 IEEE Int. Interconnect Technol. Conf. (IITC),Dresden, Germany 193-195 2011年5月査読有り

Effects of Cu Self-Capping and Ta Capping on Nanometer-Sized Cu Films Sputter-Deposited on beta-Ta

Hisanori Tanimoto, Takayuki Sugimori, Shoichiro Kumamoto, Hazuki Matsui, Hiroshi Mizubayashi

MATERIALS TRANSACTIONS 52(1) 1 - 7 2011年1月査読有り