2006年
First-Principles Calculation of Rlectrostatic Property of the Interface : Ultra-thin-Al/Si(111)
The Japan Society of Applied PhysicsExtended Abstracts of 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices -Science and Technology- (IWDTF 2006)
- 開始ページ
- 111
- 終了ページ
- 112