2005年
Fabrication of carbon nanowalls by dc plasma-enhanced chemical vapor deposition and characterization of their structures
2005 5th IEEE Conference on Nanotechnology
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- 巻
- 2
- 号
- 開始ページ
- 669
- 終了ページ
- 672
- 記述言語
- 英語
- 掲載種別
- 研究論文(国際会議プロシーディングス)
- DOI
- 10.1109/NANO.2005.1500805
Two-dimensional carbon nanostructures called carbon nanowalls (CNWs) were fabricated using dc plasma-enhanced chemical vapor deposition with a gas mixture of CH4, H2 and Ar. CNWs were vertically grown on quartz and Si substrates at temperatures of 500 to 800°C. The size of CNWs was controlled by growth conditions such as CH4/H2 ratio and substrate temperature. The structures of CNWs were characterized by Raman spectroscopy. The spectral features of CNWs are distinguished from those of typical graphite-like carbons reported so far. From the comparison of the spectral features, it is shown that CNWs are composed of small crystallites with a high degree of graphitization. ©2005 IEEE.
- ID情報
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- DOI : 10.1109/NANO.2005.1500805
- SCOPUS ID : 33746862187