MISC

2004年

Micro-tribological properties of diamond-like carbon films prepared by ion-implantation

J. of The Surface Finishing Society of Japan
  • 斉藤 喬士
  • ,
  • 三宅 正二郎
  • ,
  • 渡部 修一
  • ,
  • 諸貫 正樹

55, 594-600
9
開始ページ
594
終了ページ
600
記述言語
日本語
掲載種別
DOI
10.4139/sfj.55.594
出版者・発行元
The Surface Finishing Society of Japan

The effects of high energy ion-implantation treatment on the mechanical properties of diamond-like carbon (DLC) films have been investigated in this study. The micro-tribological properties of DLC films formed by using various methods such as ion-beam enhanced deposition (IBED) and plasma based ion-implantation (PBII) have been examined by means of atomic force microscopy (AFM) and acoustic emission (AE) oscillation scratch tester. With the PBII method DLC films were deposited on silicon wafer under conditions of a pulse bias of −5 to −20kV in an atmosphere of CH4 plasma. DLC films were deposited with the IBED Method by means of ion-plating and the deposition was performed using the methods of dynamic mixing and static mixing at an acceleration voltage of 120kV. These main results of above-mentioned tests are summarized as follows.<br> (1) In case of DLC films deposited by the PBII method, there is an existing peak voltage at which the maximum hardness and durability were provided.<br> (2) DLC films deposited with PBII method shows higher hardness than these deposited with the IBED method does but they also have brittleness is large. Therefore, the quantity of micro wear of DLC films with PBII was larger than that of DLC films with IBED.<br> (3) The critical load of PBII-DLC films increased with an increase on a peak voltage. And, the adhesive strength of ion beam mixing DLC films deposited at 120kV is similar to that of PBII films deposited at a peak voltage of several tens of kV.<br>

リンク情報
DOI
https://doi.org/10.4139/sfj.55.594
CiNii Articles
http://ci.nii.ac.jp/naid/10013611070
CiNii Books
http://ci.nii.ac.jp/ncid/AN1005202X
URL
http://id.ndl.go.jp/bib/7111085
URL
https://jlc.jst.go.jp/DN/JALC/00242998875?from=CiNii
ID情報
  • DOI : 10.4139/sfj.55.594
  • ISSN : 0915-1869
  • CiNii Articles ID : 10013611070
  • CiNii Books ID : AN1005202X

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