KATO Isamu

J-GLOBAL         Last updated: Feb 25, 2015 at 02:53
 
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Name
KATO Isamu
URL
http://www.waseda.jp/sem-profkatoken/index.html
Affiliation
Waseda University
Section
Faculty of Science and Engineering
Job title
Professor
Degree
Doctor(Engineering)(Waseda University (Japan))

Research Areas

 
 

Education

 
 
 - 
1972
Electronic Engineering, Graduate School, Division of Science and Engineering, Waseda University
 
 
 - 
1967
Elctronics and Telecommunication, Faculty of Science and Engineering, Waseda University
 

Committee Memberships

 
1985
 - 
1987
The Institute of Electronics, Information and Comunication Engineers  
 
1992
 - 
2005
The Institute of Electrical Engineers  
 
1988
 - 
1990
The Japan Society of Applied Physics  
 
1981
 - 
1988
The Vacuum Society of Japan  
 

Misc

 
Isamu Kato,Shinji Hara,and Shinichi Wakana
J. Appl. Phys.   54(9) 4883-4888   1983
Coaxial-line type microwave plasma CVD system to fabricate SiN films
Isamu Kato,Y.Sachiyama,and Kazuto Noguchi
J. Appl. Phys.   J68-C/10 788-795   1985
Fabrication of a-Si : H thin films in and out of plasma by coaxial line type microwave plasma CVD
Isamu Kato,Motoyasu Yano
J. Appl. Phys.   J69-C/5 662-668   1986
Isamu Kato,Tetsuya Ueda,and Kazuhisa Hatanaka
J. Appl. Phys.   106(8) 391-397   1986
Polymer thin film waveguide polarizar with a-Si : H clad
Isamu Kato,Yasuyuki Sugiyama,and Kotaro Sugita
J.Appl.Phys   J71-C/1    1987

Works

 
Influences of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System
1994
Dependence of Properties of SiN Film on End Position of Inner Tube in Double Tube Coaxial Line Type MPCVD System
1994
Ingluence of N2 Gas Flow Rate on Film Properties of SiN Film
1994
High Rate Deposition of a-SiiH Films by Coaxial Line Type MPCVD System
1994
Fabrication of SiN Films on Magnetic Tape For Protective Film by Coaxial Line Type MPCVD System
1994

Research Grants & Projects

 
Microwave Plasma CVD
Measurement Method of Super thin Film by Light Wave Guide
Plasma Electronics