 | | |
| |
| | KATO Isamu Last updated: Feb 25, 2015 at 02:53 Education - 1972 Electronic Engineering, Graduate School, Division of Science and Engineering, Waseda University - 1967 Elctronics and Telecommunication, Faculty of Science and Engineering, Waseda University Committee Memberships 1985 - 1987 The Institute of Electronics, Information and Comunication Engineers 1992 - 2005 The Institute of Electrical Engineers 1988 - 1990 The Japan Society of Applied Physics 1981 - 1988 The Vacuum Society of Japan Misc Isamu Kato,Shinji Hara,and Shinichi Wakana J. Appl. Phys. 54(9) 4883-4888 1983 Coaxial-line type microwave plasma CVD system to fabricate SiN films Isamu Kato,Y.Sachiyama,and Kazuto Noguchi J. Appl. Phys. J68-C/10 788-795 1985 Fabrication of a-Si : H thin films in and out of plasma by coaxial line type microwave plasma CVD Isamu Kato,Motoyasu Yano J. Appl. Phys. J69-C/5 662-668 1986 Isamu Kato,Tetsuya Ueda,and Kazuhisa Hatanaka J. Appl. Phys. 106(8) 391-397 1986 Polymer thin film waveguide polarizar with a-Si : H clad Isamu Kato,Yasuyuki Sugiyama,and Kotaro Sugita J.Appl.Phys J71-C/1 1987 Works Influences of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System 1994 Dependence of Properties of SiN Film on End Position of Inner Tube in Double Tube Coaxial Line Type MPCVD System 1994 Ingluence of N2 Gas Flow Rate on Film Properties of SiN Film 1994 High Rate Deposition of a-SiiH Films by Coaxial Line Type MPCVD System 1994 Fabrication of SiN Films on Magnetic Tape For Protective Film by Coaxial Line Type MPCVD System 1994 Research Grants & Projects Measurement Method of Super thin Film by Light Wave Guide |
|
|
|
| |
