NAKANO Takeo

J-GLOBAL         Last updated: May 6, 2019 at 13:40
 
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Name
NAKANO Takeo
URL
http://surf.ml.seikei.ac.jp/~nakano/
Affiliation
Seikei University
Section
Faculty of Science and Technology, Department of Materials and Life Science
Job title
Professor
Degree
Doctor Engineering(The University of Tokyo)
Research funding number
40237342
Twitter ID
nakanot

Research Areas

 
 

Education

 
 
 - 
1991
Graduate School, Division of Engineering, The University of Tokyo
 
 
 - 
1989
Faculty of Engineering, The University of Tokyo
 

Awards & Honors

 
Dec 2015
Poster Award at 56th annual meeting of the Vacuum Society of Japan, The Vacuum Society of Japan
 

Published Papers

 
Takeo Nakano, Tomoki Narita, Kei Oya, Masayoshi Nagao, Hisashi Ohsaki
Jounal of Vacuum Science & Technology B   35(2) 022204   Mar 2017   [Refereed]
In this study, an array of Mo cones for volcano-structured Spindt-type microelectron emitters were fabricated. A recently developed triode high power pulsed magnetron sputtering system was used to control the positive plasma potential and efficien...
Takeo Nakano, Yudai Saitou, Kei Oya
Surface and Coatings Technology   in press   Dec 2016   [Refereed]
The growth of the target erosion profile (racetrack) in DC magnetron sputtering has been experimentally studied at a modest target power. Unbalanced magnetron sputtering (UBMS) and balanced magnetron sputtering (BMS) of a copper target were conduc...
Takeo Nakano, Yudai Saitou, Mariko Ueda, Noriaki Itamura, Shigeru Baba
Journal of the Vacuum Society of Japan   58 261-264   Jul 2015   [Refereed]
© 2015, Vacuum Society of Japan. All rights reserved. The evolution of target "race track" erosion was evaluated experimentally during the conventional DC magnetron sputtering of metal targets with different Ar gas pressure environments. At gas pr...
Motoki Inoue, Takeo Nakano, Akihiro Yamasaki
Sustainable Materials and Technologies   3 14-16   Apr 2015   [Refereed]
A novel material for recovery and separation of precious metal using grape-derived waste has been developed. The material was fabricated glutaraldehyde-crosslinked polyphenol, which derived from grape-derived wastes. Adsorption performance of prec...
Takeo Nakano, Ryo Yamazaki, Shigeru Baba
Journal of the Vacuum Society of Japan   57(4) 152-154   Apr 2014   [Refereed]
The transport process of sputtered atoms has been studied experimentally through deposition rate measurement by changing the target-to-substrate (T-S) distance systematically along with the gas pressure and target element. The deposition rate show...

Misc

 
NAKANO Takeo
Journal of the Vacuum Society of Japan   60(9) 339-340   Sep 2017   [Invited]
High Power Impulse/Pulsed Magnetron Sputtering (HiPIMS/HPPMS) process has several interesting aspects and is vigorously studied in recent years. In this preface, some trends in HiPIMS research are briefly reviewed: 1) the applicability of HiPIMS t...
NAKANO Takeo
Journal of the Surface Science Society of Japan   38(5) 223-228   May 2017   [Refereed][Invited]
High power pulsed magnetron sputtering (HPPMS) is a variant of sputtering deposition method in that pulsed power is applied to the sputtering target with low repetition frequency and small duty ratio. It produces high density plasma intermittently...
柴田 一, 中野 武雄, 馬場 茂
成蹊大学理工学研究報告   51(1) 1-5   Jun 2014
Curing process of acrylic coating on a slide glass is monitored with a microtribometer. The microtribometer equips a hemispherical diamond tip of 16 μm in radius and the tip is reciprocated on the coating surface. The tip is mounted at a free end ...
Takeo Nakano
Journal of the Vacuum Society of Japan   57 308-312   Jan 2014
Discharge plasma, especially that generated at low gas pressures, is an important application of vacuum technology. This article describes the unique features of low gas pressure plasma, generation of plasma discharge and various plasma parameters...
Takeo Nakano, Takeo Nakano
Journal of the Vacuum Society of Japan   56 472-473   Dec 2013

Books etc

 
Adhesion Aspects of Thin Films, Vol. 2
VSP (Netherland)   2005   

Conference Activities & Talks

 
Hyuga Taniguchi, Kei Oya, Takeo Nakano, Masayoshi Nagao, Hisashi, Ohsaki, Katuhisa Murakami
IEICE technical report. Electron devices   24 Oct 2018   The Institute of Electronics, Information and Communication Engineers (IEICE), Japan
Spindt-type emitter is one of the vacuum electron sources prepared by semiconductor manufacturing technologies. On its fabrication, microcavities with a hole on their ceiling are prepared on a Si substrate, and an emitter material (e.g. Mo) is dep...
Tomoya Yoshida, Masayoshi Nagao, Takashi Nishi, Nobuko Koda, Takeo Nakano
Proceedings of the International Display Workshops   1 Dec 2012   
A new fabrication method of Spindt-type emitters will be presented. In our method, a double-layered photoresist is used as a parting layer, and high-power impulse magnetron sputtering is used instead of e-beam evaporator for emitter-cone formation...
Tomoya Yoshida, Masayoshi Nagao, Nobuko Koda, Takashi Nishi, Hisashi Ohsaki, Takeo Nakano
Technical Digest - 25th International Vacuum Nanoelectronics Conference, IVNC 2012   19 Nov 2012   
We propose Spindt-type field emitter array fabrication process using the high power impulse magnetron sputtering (HiPIMS) deposition. HiPIMS method can get a lot of ionized sputtering particles due to high plasma density. We think that highly coll...
YOSHIDA Tomoya, NAGAO Masayoshi, KODA Nobuko, NISHI Takashi, NAKANO Takeo
IEICE technical report. Electron devices   12 Nov 2012   
A novel fabrication method of Spindt-type field emitter array will be presented. In our method, a double-layered photoresist is used as a parting layer, and high-power impulse magnetron sputtering is used instead of e-beam evaporator for emitter-c...

Research Grants & Projects

 
Ministry of Education, Culture, Sports, Science and Technology: Grants-in-Aid for Scientific Research(基盤研究(C))
Project Year: 2009 - 2011    Investigator(s): Shigeru BABA
Oxygen incorporation mechanism during reactive sputtering of titanium nitride was studied. Deposition condition was 2-5 W/cm^<2> and 0.05-0.2 nm/s. High purity films could be obtained in a partial pressure of less than 1×10^<-5> Pa of O_2.Introduc...
Ministry of Education, Culture, Sports, Science and Technology: Grants-in-Aid for Scientific Research(基盤研究(C))
Project Year: 2007 - 2009    Investigator(s): Takeo NAKANO
Reactive sputter deposition process has been studied for the precise control of deposited film composition. We clarified the effects of transport process of sputtered metal atoms and sticking probability of reactive gases. Especially, the former l...
Evolution of surface roughness of growing sputter deposited film
Project Year: 1998   
Study on Electical and Structual properties of Cu-In alloy films
Project Year: 1995   
Ministry of Education, Culture, Sports, Science and Technology: Grants-in-Aid for Scientific Research(一般研究(C))
Project Year: 1993 - 1994    Investigator(s): Shigeru BABA
MgO films of 200 nm thick were prepared by magnetron sputtering of MgO target in an Aratmosphere of about 2 Pa.X-ray excited photoelectron emission spectrum (XPS) of the films was measured with ESCA PHI 1600 by an excitation of x-rays of 1253.6 eV...