SHIRASAKI HIROKIMI

J-GLOBAL         Last updated: Oct 8, 2019 at 11:43
 
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Name
SHIRASAKI HIROKIMI

Profile

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Research Interests

 
 

Academic & Professional Experience

 
 
   
 
Adjunct Lecturer, Tamagawa University College of Engineering, Department of Intelligent Mechanical Systems
 
Apr 1999
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Today
Professor, Tamagawa Academy
 
Apr 1990
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Mar 1999
Associate professor, Tamagawa Academy
 
Apr 1982
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Mar 1990
Lecturer, Tamagawa Academy
 
Apr 1979
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Mar 1982
Lecturer, Tamagawa Academy
 

Education

 
Apr 1970
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Mar 1974
Electrical Engineering, Faculty of Engineering Science, Osaka University
 

Published Papers

 
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Hirokimi Shirasaki
9778 69   Feb 2016   [Refereed]
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Hirokimi Shirasaki
9424 9424211-9424217   May 2015   [Refereed]
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Hirokimi Shirasaki
9424 70   Feb 2015   [Refereed]
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Hirokimi Shirasaki
9050 90502K1-90502K7   May 2014   [Refereed]
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Hirokimi Shirasaki
9050-91    Feb 2014   [Refereed]

Misc

 
Scatterometry simulator development
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-   24pBS2    2012
Career Education and  Internship
Hirokimi Shirasaki, Yasusi Fukuda
-   47 29-35   2012
Hirokimi SHIRASAKI
Proceedings of SPIE, Advanced Microlithography 2010   7638 76382V-1~76382V-6   2010
Hirokimi Shirasaki
Proceedings of SPIE, Advanced Microlithography 2008   6922 69223T-1~69223T-9   2008
3D Semiconductor Grooves Measurement Simulations (Scatterometry) using Nonstandard FDTD Methods.
Hirokimi Shirasaki
SPIE Advanced Microlithography 2008   6922 147   2008

Books etc

 
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Nov 2006   
Linewidth measurement simulations for semiconductor circuits by scatterometry using the FDTD and the time shortening calculation method
SPIE's 18th annual symposium on microlithography   Feb 2004   
Arbitrary 3D linewidth forms measurement simulations for the next-generation semiconductor circuits by scatterometry using the FDTD method
SPIE's 18th annual symposium on microlithography   Feb 2004   
Recent reserch developments in electronics & communications.(Co-author)
Transworld research network   Mar 2003   
Resist and Silicon Trench Array Linewidth Measurement Simulations for the Next-Generation Semiconductor Circuits by Optical Scattering Properties Using the FDTD Method
"Metrology, Inspection, and Process Control for Microlithography XVII", Proceedings of SPIE   Mar 2003   

Conference Activities & Talks

 
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-   30 Aug 2007   
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-   12 Jun 2007   
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-   5 Jul 2006   
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-   27 Oct 2004   
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-   31 Aug 2004   

Works

 
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2008 - Today
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2006 - Today
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2003 - Today
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2003 - Today

Research Grants & Projects

 
Study on microwave circuits and radiators
Scatterometry analysis by RCWA methods
Study on optical measurement of shapes of semiconductor trenchesby wavelet prosessing.
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Others

 
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2003   -
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2003   -
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