KOTERA Masatoshi

J-GLOBAL         Last updated: Oct 6, 2018 at 22:28
 
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Name
KOTERA Masatoshi
Affiliation
Osaka Institute of Technology
Section
Faculty of Engineering Department of Electronics,Information and Communication Engineering
Job title
Professor
Degree
Doctor of Engineering(Osaka Prefecture University)

Research Areas

 
 

Education

 
 
 - 
1982
Graduate School, Division of Engineering, Osaka Prefecture University
 
 
 - 
1977
Faculty of Engineering, Osaka Prefecture University
 

Misc

 
KOTERA Masatoshi
IEEJ Transactions on Sensors and Micromachines   126(6) 683-689   Jun 2006
The precision of electron beam lithography is analyzed using simulations of electron beam behavior in an electron optics, electron scattering behavior in a resist film on Si wafer, dissolution behavior of resist surface irradiated in the developme...
KOTERA Masatoshi
Journal of the Society of Materials Science, Japan   55(2) 177-182   Feb 2006
Electron beam lithography simulation is presented. A line pattern edge roughness of a resist after development process is discussed based on simulations of electron scattering in the resist film and the resist development process. Fixed threshold ...
Tomotaka KOUZUKI, Hiroshi SUGA, Masatoshi KOTERA
Memoirs of the Osaka Institute of Technology. Series A, Science & technology   46(2) 29-36   Feb 2002
KOSONE Mikio, ZHOU Hong, KOTERA Masatoshi
Proceedings of the Society Conference of IEICE   2000(1)    Sep 2000
TAMURA Keiji, YASUDA Masaaki, MURATA Kenji, KOTERA Masatoshi
SHINKU   43(3) 259-262   Mar 2000
The electron spin-polarization scanning electron microscope (spin-SEM) uses the polarization of secondary electrons scattered out from magnetic materials to image the surface magnetic structure. The magnetic-domain contrast of the spin-SEM depends...

Association Memberships

 
 

Works

 
Development of EB direct write Mask Simulation
1998 - 2000
Simulation for EB projection Exposure
2000 - 2001

Research Grants & Projects

 
Theoretical Evaluation of the SEM Image
Analysis of Electron Beam Lithography system
Sub-micron fablication technology with Electron Bea
Electrical charging of materials during electron beam irradiation
Project Year: 2000