橘 邦英

Plasma copolymerization of C6F6/C5F8 for application of low-dielectric-constant fluorinated amorphous carbon films and its gas-phase diagnostics using in situ Fourier transform infrared spectroscopy 

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 43(5A) 2697-2703 2004年5月  

Thermal decomposition mechanism of a titanium source, Ti-(MPD)-(METHD)(2), in MOCVD 

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 151(12) C806-C810 2004年  

In situ infrared spectroscopic study on a titanium source in MOCVD 

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 151(10) C605-C609 2004年  

Observation of self-organized filaments in a dielectric barrier discharge of Ar gas 

APPLIED PHYSICS LETTERS 83(12) 2309-2311 2003年9月  

Plasma enhanced chemical vapor deposition of fluorinated amorphous carbon films on the surface with reverse tapered microstructures 

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 42(7A) 4504-4509 2003年7月  

Effects of pulsed potential on address electrode in a surface-discharge alternating-current plasma display panel 

APPLIED PHYSICS LETTERS 82(22) 3844-3846 2003年6月  

Characterization of porosity and dielectric constant of fluorocarbon porous films synthesized by using plasma-enhanced chemical vapor deposition and solvent process 

APPLIED PHYSICS LETTERS 82(15) 2476-2478 2003年4月  

Three-dimensional diagnostics of dynamic behaviors of excited atoms in microplasma for plasma display panels 

IEEE TRANSACTIONS ON PLASMA SCIENCE 31(1) 68-73 2003年2月  

Reaction mechanism of alkoxy derivatives of titanium diketonates as source molecules in liquid source metalorganic chemical vapor deposition of (Ba,Sr)TiO3 films: A study by in situ infrared absorption spectroscopy 

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 41(11B) 6624-6627 2002年11月  

Reaction mechanism of alkoxy derivatives of titanium diketonates as source molecules in liquid source metalorganic chemical vapor deposition of (Ba,Sr)TiO3 films: A study by in situ infrared absorption spectroscopy 

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 41(11B) 6624-6627 2002年11月  

Measurements of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy 

JOURNAL OF APPLIED PHYSICS 92(10) 5684-5690 2002年11月  

Photoresist selectivity mechanism in SiO2 etching by inductively coupled plasma using fluorocarbon gases 

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 20(4) 1482-1488 2002年7月  

Numerical simulation of metal-halide lamp using a time-dependent two-dimensional model 

JOURNAL OF APPLIED PHYSICS 92(1) 45-54 2002年7月  

Ab initio calculations of the dissociative attachment resonance energies for an octafluorocyclopentene molecule with comparisons to electron attachment mass spectrometric measurements 

APPLIED PHYSICS LETTERS 80(21) 3904-3906 2002年5月  

Effects of O-2 gas on reaction mechanisms in the chemical vapor deposition of (Ba,Sr)TiO3 thin film 

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 41(4A) 2231-2240 2002年4月  

Solid particle production in fluorocarbon plasmas Ⅱ: Gas phase reactions for polymerization 

Journal of Vacuum Science and Technology 20(2) 305-312 2002年3月  

Solid particle production in fluorocarbon plasmas II: Gas phase reactions for polymerization 

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 20(2) 305-312 2002年3月  

Film precursor formation in metalorganic chemical vapor deposition of barium strontium titanate films: A study by microdischarge optical emission spectroscopy 

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 41(2A) 778-783 2002年2月