論文

査読有り
2003年1月

Optical absorption of nanometer-sized band-edge-modulated amorphous silicon-nitrogen films

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
  • M Yamaguchi
  • ,
  • C Ogihara
  • ,
  • K Morigaki

97
2
開始ページ
135
終了ページ
140
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/S0921-5107(02)00422-1
出版者・発行元
ELSEVIER SCIENCE SA

Optical absorption of nanometer-sized band-edge-modulated (BM) amorphous silicon-nitrogen (a-Si1-xNx:H) films, BM films, are discussed using the effective medium expression and characterized in terms of the optical gap E-g, the value of the slope in Tauc plot B, the Urbach energy E-u and the refractive index no as functions of the modulation period L and their correlations between them. E-g in BM film increases with decreasing L without changing n(0), i.e., average composition in the film. This results in the quantum-size effect. The values of B are hardly affected by L, while E increases with decreasing L. The increase in E is not expected from the effective medium expression and attributed to the effect caused by the sinusoidal modulation of the band-edge. (C) 2002 Elsevier Science B.V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/S0921-5107(02)00422-1
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000181012400005&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/S0921-5107(02)00422-1
  • ISSN : 0921-5107
  • Web of Science ID : WOS:000181012400005

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