MISC

2002年9月

Elimination of droplets using a vane velocity filter for pulsed laser ablation of FeSi2

APPLIED SURFACE SCIENCE
  • T Yoshitake
  • ,
  • G Shiraishi
  • ,
  • K Nagayama

197
開始ページ
379
終了ページ
383
記述言語
英語
掲載種別
DOI
10.1016/S0169-4332(02)00344-6
出版者・発行元
ELSEVIER SCIENCE BV

Semiconducting beta-FeSi2 is a future promising material for Si-ULSI compatible optoelectronics devices, solar cells and IR photo-sensors. Pulsed laser deposition (PLD) make possible low temperature growth of beta-FeSi2. However many droplets are codeposited with the ablation species, and thus the films obtained by PLD are difficult to be applied for electronic devices. In order to eliminate droplets, a vane velocity filter was adapted. The droplets decreased drastically. The velocity distribution was obtained for various droplet sizes. The maximum velocity of droplets is at most 65 m/s. It is possible to eliminate the droplets completely at the suitable cutoff velocity of the filter. (C) 2002 Elsevier Science B.V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/S0169-4332(02)00344-6
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000179261100067&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/S0169-4332(02)00344-6
  • ISSN : 0169-4332
  • Web of Science ID : WOS:000179261100067

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