論文

査読有り
2014年7月

Isolable Aryl-Substituted Silyl Radicals: Synthesis, Characterization, and Reactivity

CHEMISTRY-A EUROPEAN JOURNAL
  • Kanako Taira
  • ,
  • Masaaki Ichinohe
  • ,
  • Akira Sekiguchi

20
30
開始ページ
9342
終了ページ
9348
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1002/chem.201402482
出版者・発行元
WILEY-V C H VERLAG GMBH

Isolable aryl-substituted silyl radicals (tBu(2)MeSi)(2)(Ar)Si (Ar=C6H5, 4-tBuC(6)H(4), 4-PhC6H4, 3,5-tBu(2)C(6)H(3)) were synthesized by the reaction of the corresponding iodosilane with an equimolar amount of potassium graphite (KC8) in tetrahydrofuran (THF). The crystal structure of 3,5-tBu(2)C(6)H(3) derivative, which was determined by Xray crystallography, showed a planar geometry around the Si atom for the radical center. EPR studies of all four radicals revealed the lack of the delocalization of the unpaired electron over the aromatic ring. Reactivity and spectroscopic studies of the less-hindered phenyl-substituted silyl radical showed that it exists as an equilibrium mixture of the radical and its silene-type dimer in solution.

Web of Science ® 被引用回数 : 8

リンク情報
DOI
https://doi.org/10.1002/chem.201402482
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000339568800028&DestApp=WOS_CPL