WATANABE Takeo

J-GLOBAL         Last updated: Jan 14, 2019 at 16:36
 
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Name
WATANABE Takeo
Affiliation
University of Hyogo
Section
Laboratory of Advanced Science and Technology for Industry
Degree
Ph.D.(Osaka City University)

Research Areas

 
 

Academic & Professional Experience

 
Apr 2016
 - 
Today
Director, Laboratory of Advanced Science and Technology for Industry, University of Hyogo
 
Apr 2015
 - 
Today
Professor, Laboratory of Advanced Science and Technology for Industry, University of Hyogo
 
Apr 2008
 - 
Mar 2014
Associate Professor, Laboratory of Advanced Science and Technology for Industry, University of Hyogo
 
Apr 2007
 - 
Mar 2008
Assistant professor, Laboratory of Advanced Science and Technology for Industry, University of Hyogo
 
Apr 2004
 - 
Mar 2007
Research Associate, Laboratory of Advanced Science and Technology for Industry, University of Hyogo
 

Education

 
Apr 1987
 - 
Sep 1990
Physics, Osaka City University
 

Committee Memberships

 
Jan 2013
 - 
Today
International Conference on Electron Ion Photon Beam Technology and Nanofabrication  Program Committee
 
Apr 2006
 - 
Today
International Conference on Photopolymer Science and Technology  Organizing Committee
 
Apr 2005
 - 
Today
International Conference on Photopolymer Science and Technology  Program Committee
 
Apr 2004
 - 
Today
International Conference on Photopolymer Science and Technology  Session Chair
 
Jan 2005
 - 
Dec 2005
The 8th International Conference on X-ray Microscope (XRM2005)  Executive committee
 

Awards & Honors

 
Jun 2013
R&D of EUV Lithography, Best Paper Award, International Workshop on EUV Lithography
 
Jun 2008
EUV interference lithography employing 11-m long undulator as a light source, Best Poster Award 1st Place, International Workshop on EUV Lithography
 
Mar 2002
Direct Observation of Sequential Weak Decay of a Double Hypernucleus, The 7th Outstanding Paper Award of the Physical Society of Japan, The Physical Society of Japan
 
May 2016
Resist Research and Development using SR, The Award of Osaka Nuclear Society Association, Osaka Nuclear Society Association
 

Published Papers

 
In-Situ Measurement of Outgassing Generated from EUV Metal Oxide Nanoparticles Resist During Electron Irradiation
Seiji Takahashi, Hiroko Minami, Yoko Matsumoto, Yoichi Minami, Mikio Kadoi, Atsushi Sekiguchi, Takeo Watanabe
J. Photopolym. Sci. Technol.   31 257-260   2018   [Refereed]
Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Lithography System
Hiroto Kudo, Shizuya Ohori, Hiroya Takeda, Hiroki Ogawa, Takeo Watanabe, Hiroki Yamamoto, Takahiro Kozawa
J. Photopolym. Sci. Technol.   31 221-225   2018   [Refereed]
Fabrication of High-Aspect-Ratio Transmission Grating Using DDR Process for 10-nm EUV Resist Evaluation by EUV Interference Lithography
Mana Yoshifuji, Shota Niihara, Tetsuo Harada, Takeo Watanabe
J. Photopolym. Sci. Technol.,   31 215-220   2018   [Refereed]
Synthesis of Hyperbranched Polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene; Resist Properties for Extreme Ultraviolet (EUV) Lithography,
Hiroto Kudo, Mari Fukunaga; Kohei Shiotsuki; Hiroya Takeda; Hiroki Yamamoto; Takahiro Kozawa; Takeo Watanabe
Reactive and Functional Polymers      2018   [Refereed]
Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material
J. Photopolym. Sci. Technol.
30 103-107   2017   [Refereed]

Misc

 
Charm Meson Production in 800-GeV/c Proton-Emulsion Interactions (共著)
Phys.Lett.B263,   263(3-4) 573-578   1991
Charm Pair Correlations in 800-GeV/c Proton-Emulsion Interactions (共著)
Phys.Lett.B263,   263(3-4) 579-583   1991
Prog.Theor.Phys.,   85(5) 951-956   1991

Conference Activities & Talks

 
Research activity of evaluation tools including soft X-ray optics for the research of EUV lithography at University of Hyogo
Takeo Watanabe, Tetsuo Harada
Physics of X-ray and Neutron Multilayer Structures (PXRNMS2018)   7 Nov 2018   
Rsearch Activities of Extreme Ultraviolet Lithography at University of Hyogo
Takeo Watanabe and Tetsuo Harada
Micro Nano Engineering 2018   24 Sep 2018   
Photopolymer Technology for Extreme Ultraviolet Lithography [Invited]
Takeo Watanabe
Polymer World Congress 2018   3 Sep 2018   
Toward the Analysis of the Origin of Stochastic [Invited]
Takeo Watanabe
Panel Symposium in English: “EUV Resist Sensitization and Roughness Improvement: Can We Get Both?”, The 35th International Conference of Photopolymer Science and Technology   25 Jun 2018   
(171) In-Situ Measurement of Outgassing Generated from EUV Metal Oxide Nanoparticles Resist During Electron Irradiation
Seiji Takahashi, Hiroko Minami, Yoko Matsumoto, Yoichi Minami, Mikio Kadoi, Atsushi Sekiguchi, Takeo Watanabe
The 35th International Conference of Photopolymer Science and Technology   25 Jun 2018   

Association Memberships

 
 

Research Grants & Projects

 
Study on Extreme Ultra Violet Lithography
Decomposition reaction of organic material by SR irradiation
Multilayer reflectivity measurement

Patents

 
韓国特許権設定登録 第10-1350717号 : (7) Photosensitive Resin, and Photosensitive Composition
WATANABE Takeo
Resist Patterns and Method of Forming Resist Patterns(United States Patent)
Patent# 5, 326, 672(1994)
US Patent # 5,326,672 : (1) Resist Patterns and Method of Forming Resist Patterns
WATANABE Takeo
台湾出願番号 76516 : (2) Photoresist polymer having nanosmoothness and etching ressistance and resist composition
WATANABE Takeo
PatternsEurope Patent Priority: JP/09.09.04/JPA 2004262488 : (4) Electron Beam or EUV (Extreme Ultraviolet) Resist Composition and Process for the Formation of Resist
WATANABE Takeo