2006年2月
Direct fabrication of photonic crystal on glass substrate by nanoimprint lithography
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
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- 巻
- 45
- 号
- 4-7
- 開始ページ
- L210
- 終了ページ
- L212
- 記述言語
- 英語
- 掲載種別
- 研究論文（学術雑誌）
- DOI
- 10.1143/JJAP.45.L210
- 出版者・発行元
- INST PURE APPLIED PHYSICS
We have successfully fabricated a two-dimensional photonic crystal with a 300 mm period on a glass substrate by direct nanoimprint lithography. A uniform photonic crystal with an area of 3 x 3 mm 2 was obtained at the relatively low temperature of 360 degrees C. Our results can be applied to make various photonic-nanostructure devices.
- リンク情報
- ID情報
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- DOI : 10.1143/JJAP.45.L210
- ISSN : 0021-4922
- Web of Science ID : WOS:000235902900033