MATSUO Jiro

J-GLOBAL         Last updated: May 21, 2019 at 02:40
 
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Name
MATSUO Jiro
Affiliation
Kyoto University
Section
Graduate School of Engineering, Quantum Science and Engineering Center, Graduate School of Engineering Quantum Science and Engineering Center
Job title
Associate Professor,Associate Professor
Degree
(BLANK)(Kyoto University)

Research Areas

 
 

Education

 
 
 - 
1984
Faculty of Electro Communications, Kyoto University
 

Published Papers

 
Prutchayawoot Thopan, Hubert Gnaser, Rika Oki, Takaaki Aoki, Toshio Seki, Jiro Matsuo
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY   430    Jul 2018   [Refereed]
Hubert Gnaser, Wolfgang Bock, Jiro Matsuo
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   36(3)    May 2018   [Refereed]
Bostjan Jencic, Luka Jeromel, Nina Ogrinc Potocnik, Katarina Vogel-Mikus, Primoz Vavpetic, Zdravko Rupnik, Klemen Bucar, Matjaz Vencelj, Mitja Kelemen, Jiro Matsuo, Masakazu Kusakari, Zdravko Siketic, Muhammad A. Al-Jalali, Abdallah Shaltout, Primoz Pelicon
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS   404    Aug 2017   [Refereed]
Toshio Seki, Hiroki Yamamoto, Takahiro Kozawa, Tadashi Shojo, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo
JAPANESE JOURNAL OF APPLIED PHYSICS   56(6)    Jun 2017   [Refereed]
T. Seki, H. Yamamoto, T. Kozawa, K. Koike, T. Aoki, J. Matsuo
APPLIED PHYSICS LETTERS   110(18)    May 2017   [Refereed]
Takaaki Aoki, Toshio Seki, Jiro Matsuo
SURFACE & COATINGS TECHNOLOGY   306    Nov 2016   [Refereed]
K. Suzuki, M. Kusakari, M. Fujii, T. Seki, T. Aoki, J. Matsuo
SURFACE AND INTERFACE ANALYSIS   48(11)    Nov 2016   [Refereed]
Makiko Fujii, Rie Shishido, Takaya Satoh, Shigeru Suzuki, Jiro Matsuo
RAPID COMMUNICATIONS IN MASS SPECTROMETRY   30(14)    Jul 2016   [Refereed]
Toshio Seki, Yu Yoshino, Takehiko Senoo, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo
JAPANESE JOURNAL OF APPLIED PHYSICS   55(6)    Jun 2016   [Refereed]
Takaya Satoh, Hironobu Niimi, Naoki Kikuchi, Makiko Fujii, Toshio Seki, Jiro Matsuo
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY   404    Jun 2016   [Refereed]
Hubert Gnaser, Masakazu Kusakari, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   34(3)    May 2016   [Refereed]
Masakazu Kusakari, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   34(3)    May 2016   [Refereed]
Yuta Yokoyama, Satoka Aoyagi, Makiko Fujii, Jiro Matsuo, John S. Fletcher, Nicholas P. Lockyer, John C. Vickerman, Melissa K. Passarelli, Rasmus Havelund, Martin P. Seah
ANALYTICAL CHEMISTRY   88(7)    Apr 2016   [Refereed]
Toshio Seki, Masakazu Kusakari, Makiko Fujii, Takaaki Aoki, Jiro Matsuo
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS   371    Mar 2016   [Refereed]
Rie Shishido, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo, Shigeru Suzuki
RAPID COMMUNICATIONS IN MASS SPECTROMETRY   30(4)    Feb 2016   [Refereed]
Hiroki Yamamoto, Toshio Seki, Jiro Matsuo, Kunihiko Koike, Takahiro Kozawa
MICROELECTRONIC ENGINEERING   141    Jun 2015   [Refereed]
Masakazu Kusakari, Hubert Gnaser, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY   383    May 2015   [Refereed]
I. Yamada, J. Matsuo, N. Toyoda, T. Aoki, T. Seki
CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE   19(1)    Feb 2015   [Refereed]
Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo
SURFACE AND INTERFACE ANALYSIS   47(2)    Feb 2015   [Refereed]
Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo
SURFACE AND INTERFACE ANALYSIS   47(2)    Feb 2015   [Refereed]

Misc

 
Reaction kinetics of atomic chlorine on si(100)2x1
Kazuhiro Karahashi; Jiro Matsuo; Kei Horiuchi
Materials Research Society Symposium Proceedings   280 189-192   1993   [Refereed]
Bombarding effects of gas cluster ion beams on sapphire surfaces; characteristics of modified layers and their mechanical and optical properties
D. Takeuchi; J. Matsuo; I. Yamada
Materials Research Society Symposium - Proceedings   396 279-284   1996   [Refereed]
Lateral sputtering by gas cluster ion beams and its applications to atomic level surface modification
Isao Yamada; Jiro Matsuo
Materials Research Society Symposium - Proceedings   396 149-154   1996   [Refereed]
Nanoscale processing by gas-cluster ion beams: novel technique in ion-beam processing
Isao Yamada; Jiro Matsuo
Proceedings of SPIE - The International Society for Optical Engineering   2779 759-764   1996   [Refereed]
Cluster ion implantation for shallow junction formation
Jiro Matsuo; Daisuke Takeuchi; Takaaki Aoki; Isao Yamada
Proceedings of the International Conference on Ion Implantation Technology   768-771   1996   [Refereed]
Range and damage distribution in cluster ion implantation
I. Yamada; J. Matsuo; E.C. Jones; D. Takeuchi; T. Aoki; K. Goto; T. Sugii
Materials Research Society Symposium - Proceedings   438 363-374   1996   [Refereed]
Surface processing by gas cluster ion beams
Noriaki Toyoda; Jiro Matsuo; Isao Yamada
Proceedings of the International Conference on Ion Implantation Technology   808-811   1996   [Refereed]
Molecular Dynamics Simulation of Fullerene Cluster Ion Impact
Aoki, Takaaki; Seki, Toshio; Tanomura, Masahiro; Matsuo, Jiro; Insepov, Zinetulla; Yamada, Isao
Mat. Res. Soc. Symp. Proceedings,504, pp. 81-86      1998   [Refereed]
Size Dependence of Bombardment Characteristics Produced by Cluster Ion Beam
Seki, Toshio; Tanomura, Masahiro; Aoki, Takaaki; Matsuo, Jiro; Yamada, Isao
Mat. Res. Soc. Symp. Proceedings,504, pp. 93-98      1998   [Refereed]
Ultra shallow junction formation by cluster ion implantation
Jiro Matsuo; Takaaki Aoki; Ken-ichi Goto; Toshihiro Sugii; Isao Yamada
Materials Research Society Symposium - Proceedings   532 17-22   1998   [Refereed]
Computer simulation of annealing after cluster ion implantation
Z. Insepov; T. Aoki; J. Matsuo; I. Yamada
Materials Research Society Symposium - Proceedings   532 147-152   1998   [Refereed]
Channel engineering using B10H14 ion implantation for low Vth and high SCE immunity of buried-channel PMOSFETs in 4-Gbit DRAMs and beyond
T. Tanaka; H. Ogawa; K. Goto; K. Itabashi; T. Yamazaki; J. Matsuo; T. Sugii; I. Yamada
Digest of Technical Papers - Symposium on VLSI Technology   88-89   1998   [Refereed]
STM observations of the annealing process of the damage caused by ion impact
Toshio Seki; Jiro Matsuo; Isao Yamada
Proceedings of the International Conference on Ion Implantation Technology   2 1262-1265   1999   [Refereed]
High quality oxide film formation by O2 cluster ion assisted deposition technique
J. Matsuo; W. Qin; M. Akizuki; T. Yodoshi; I. Yamada
Materials Research Society Symposium - Proceedings   504 87-92   1999   [Refereed]
Size dependence of bombardment characteristics produced by cluster ion beams
T. Seki; M. Tanomura; T. Aoki; J. Matsuo; I. Yamada
Materials Research Society Symposium - Proceedings   504 93-98   1999   [Refereed]
Formation of shallow junctions using decaborane molecular ion implantation; Comparison with molecular dynamics simulation
Majeed A. Foad; Roger Webb; Roger Smith; Erin Jones; Amir Al-Bayati; Mark Lee; Vikas Agrawal; Sanjay Banerjee; Jiro Matsuo; Isao Yamada
Proceedings of the International Conference on Ion Implantation Technology   1 106-109   1999   [Refereed]
Computer simulation of decaborane implantation and rapid thermal annealing
Zinetulla Insepov; Takaaki Aoki; Jiro Matsuo; Isao Yamada
Proceedings of the International Conference on Ion Implantation Technology   2 807-810   1999   [Refereed]
Formation of oxide thin films for optical applications by O2-cluster ion beam assisted deposition
H. Katsumata; J. Matsuo; T. Nishihara; T. Tachibana; E. Minami; K. Yamada; M. Adachi; I. Yamada
Proceedings of the International Conference on Ion Implantation Technology   2 1195-1198   1999   [Refereed]
Fullerene ion (C60+) implantation in GaAs(100) substrate
Takashi Nishihara; Hiroshi Katsumata; Jiro Matsuo; Isao Yamada
Proceedings of the International Conference on Ion Implantation Technology   2 1203-1206   1999   [Refereed]
Boron diffusion in ultra low-energy (<1 keV/atom) decaborane (B10H14) ion implantation
Takuya Kusaba; Norihiro Shimada; Takaaki Aoki; Jiro Matsuo; Isao Yamada; Kenichi Goto; Toshihiro Sugii
Proceedings of the International Conference on Ion Implantation Technology   2 1258-1261   1999   [Refereed]

Books etc

 
"Improvement of Diamond X-Ray Mask Membrane : Optical Transmittance, Surface Roughness and Irradiation Durability"
松尾 二郎
Proceedings of Micro-and Nano-Engineering '95,/,1-5   1995   
"Cluster Ion Beam Processing of Materials"
松尾 二郎
Ion Implantation Technology-IIT'94, (Elsevier Science B. V. ),/,1002-1005   1995   
"Nanoscale Processing by Gas Cluster Ion Beams-Novel Technique in Ion Beam Processing-"
松尾 二郎
Proceedings of the 3rd International Conference on Intelligent Materials,   1996   
"Cluster Ion Implantation for Shallow Junction Formation"
松尾 二郎
IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,768-771   1996   
"Novel Shallow Junction Technology Using Decaborane(B10H14)"
松尾 二郎
Proceedings of IEDM,   1996   

Research Grants & Projects

 
Collision Dynamics of Hyper-thormal Particles on Solid Surfaces
Study on Cluster Ion Beam Processing