Papers

Peer-reviewed Lead author
Aug, 1998

Thermal Expansion and de Haas-van Alphen Effect of CeRh2Si2

J.Phys.Soc.Jpn.
  • Shingo Araki
  • ,
  • Akira Misawa
  • ,
  • Rikio Settai
  • ,
  • Tetsuya Takeuchi
  • ,
  • Yoshichika Onuki

Volume
67
Number
8
First page
2915
Last page
2918
Language
English
Publishing type
Research paper (scientific journal)
DOI
10.1143/JPSJ.67.2915
Publisher
The Physical Society of Japan (JPS)

We have grown single crystals of CeRh2Si2 and LaRh2Si2, and measured the temperature dependence of the thermal expansion coefficient.The magnetic component of the thermal coefficient in CeRh2Si2 hasbeen analyzed on the basis of the crystalline electric field.We have also succeeded in observing the de Haas-van Alphen (dHvA) effect ofCeRh2Si2.The detected dHvA branches are small in cross-section and are observed in anarrow angle region centered at the symmetrical axis, reflecting themultiply-connected Fermi surface.

Link information
DOI
https://doi.org/10.1143/JPSJ.67.2915
CiNii Articles
http://ci.nii.ac.jp/naid/110001978644
CiNii Books
http://ci.nii.ac.jp/ncid/AA00704814
URL
http://id.ndl.go.jp/bib/4549390
ID information
  • DOI : 10.1143/JPSJ.67.2915
  • ISSN : 0031-9015
  • ISSN : 1347-4073
  • CiNii Articles ID : 110001978644
  • CiNii Books ID : AA00704814

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