2003年
Glass etching assisted by femtosecond pulse modification
SENSORS AND MATERIALS
- ,
- ,
- 巻
- 15
- 号
- 3
- 開始ページ
- 137
- 終了ページ
- 145
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- 出版者・発行元
- MYU, SCIENTIFIC PUBLISHING DIVISION
In this paper the etching of Pyrex glass assisted by femtosecond pulses is reported. The process consists of 2 steps: (1) irradiating the glass by focused pulses from a femtosecond laser, (2) etching the glass in diluted HF (hydrofluoric acid) a solution. The glass can be modified without cracking by applying a femtosecond laser with a very low intensity. The etched depth of Pyrex glass increases from 12 to 131 mum with femtosecond laser irradiation from 0 to 1170 kJ/cm(2), and etching in a 5% HF solution for 230 min. This technique provides an alter-native way of achieving a high etching rate of Pyrex glass for applications to micro-electro-mechanical systems (MEMS), and of forming suspended structures on the surface of a Pyrex glass substrate by using modified glass as a sacrificial layer.
- リンク情報
- ID情報
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- ISSN : 0914-4935
- Web of Science ID : WOS:000184218600002