論文

査読有り
2008年6月

Polymer surface morphology control by reactive ion etching for microfluidic devices

SENSORS AND ACTUATORS B-CHEMICAL
  • Hirofumi Nabesawa
  • ,
  • Takeshi Hitobo
  • ,
  • Suguru Wakabayashi
  • ,
  • Toyohisa Asaji
  • ,
  • Takashi Abe
  • ,
  • Minoru Seki

132
2
開始ページ
637
終了ページ
643
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.snb.2008.01.050
出版者・発行元
ELSEVIER SCIENCE SA

This paper presents the novel method to control polymer surface morphology using reactive ion etching (RIE) technique and its application to microfluidic devices. By using this method, polymer surface morphology could be controlled in the wide range between smooth surface and grassy surface with a newly developed electron cyclotron resonance (ECR)-RIE system. It was found that the polymer surface morphology is closely related to metal micromask concentration on the surface. Our system could easily control the micromask concentration only by changing the total pressure in the chamber. The etching characteristics of 75 mol% O-2-CF4 gas mixture were systematically investigated as a function of total pressure. The smoothest surface with the arithmetic mean roughness value (R-a) less than 10 nm was achieved at 0.1 Pa. On the other hand, the grassy surface with high aspect ratio of 80 was uniformly formed on the polymer surface under the higher-pressure range from 1.0 Pa to 1.5 Pa. Furthermore, the proposed method was applied to microfluidic channels with multiple pillars, and a hybrid structure with smooth and grassy surfaces. (C) 2008 Elsevier B.V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/j.snb.2008.01.050
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000257357000039&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.snb.2008.01.050
  • ISSN : 0925-4005
  • Web of Science ID : WOS:000257357000039

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