Papers

Apr 1, 2021

Development of Dry-nano-polishing Technique using Reactive Ion Etching for Ultra Thin Titanium Wafer

IEEJ Transactions on Sensors and Micromachines

Teruya Chino
Yuta Watanabe
Yosuke Tsukiyama
Masayuki Sohgawa
Takashi Abe

Volume: 141
Number: 4
First page: 103
Last page: 107
Language
Publishing type: Research paper (scientific journal)
DOI: 10.1541/ieejsmas.141.103
Publisher: Institute of Electrical Engineers of Japan (IEE Japan)

Link information

DOI: https://doi.org/10.1541/ieejsmas.141.103
URL: https://www.jstage.jst.go.jp/article/ieejsmas/141/4/141_103/_pdf

ID information

DOI : 10.1541/ieejsmas.141.103
ISSN : 1341-8939
eISSN : 1347-5525

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