2017
Development of titanium micro mold manufacturing technology for the microfluidic chip by plasma etching
Journal of the Vacuum Society of Japan
- ,
- ,
- ,
- ,
- Volume
- 60
- Number
- 4
- First page
- 145
- Last page
- 147
- Language
- Japanese
- Publishing type
- Research paper (scientific journal)
- DOI
- 10.3131/jvsj2.60.145
- Publisher
- Vacuum Society of Japan
This paper describes the microfabrication of titanium micro molds for the microfluidic chip by a reactive ion etching (RIE) system. The etching was carried out using SF6 plasma.We have examined the etching rate and surface roughness at the range of process pressure 0.3-0.7 Pa and RF (13.56 MHz radio-frequency) power 30-70 W. The etching rate is over 0.3 mm/min at the RF power of 70W. The surface roughness of etched substrates is below 40 nm at the process pressure of 0.3 Pa. We made a titanium micro mold and molded microfluidic chips by using polycarbonate, and microresico® (Polypropylene resin).
- Link information
- ID information
-
- DOI : 10.3131/jvsj2.60.145
- ISSN : 1882-2398
- SCOPUS ID : 85017641764