2017
Microstructure formation on polytetrafluoroethylene (PTFE) and perfluoroalkoxy (PFA) bulk plates by a magnetron enhanced reactive ion etching system
Journal of the Vacuum Society of Japan
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- Volume
- 60
- Number
- 5
- First page
- 176
- Last page
- 181
- Language
- English
- Publishing type
- Research paper (scientific journal)
- DOI
- 10.3131/jvsj2.60.176
- Publisher
- Vacuum Society of Japan
The etching characteristics of polytetrafluoroethylene (PTFE) and perfluoroalkoxy (PFA) bulk plates were studied in a magnetron enhanced reactive ion etching (M-RIE) system. The etch rates of the plates for oxygen plasma were investigated under the pressure range 0.1-2.0 Pa, and were found to strongly correlate with the self-bias voltage. The plates presented smooth surface in the 0.1-1.0 Pa pressure range, and rough surfaces at 1.5 Pa and 2.0 Pa. The roughness was introduced by a micromask sputtered from the chamber material. The titanium etching mask exhibited lower etch rates for oxygen plasma than aluminum and silicon dioxide. Finally, using the dry-etched titanium mask in low-pressure oxygen plasma, we fabricated a 5-μm pitch line-and-space structure on a PTFE plate and a 4-μm square pillar array on a PFA plate.
- Link information
- ID information
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- DOI : 10.3131/jvsj2.60.176
- ISSN : 1882-2398
- SCOPUS ID : 85019198241