2017年
Performance Improvement of HfS2 Transistors by Atomic Layer Deposition of HfO2
IEEE Transactions on Nanotechnology
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- 巻
- 16
- 号
- 4
- 開始ページ
- 582
- 終了ページ
- 587
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1109/TNANO.2017.2661403
- 出版者・発行元
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Hafnium disulfide (HfS2) is one of the transition metal dichalcogenides which is expected to have the high electron mobility and the finite bandgap. However, the fabrication process for HfS2 = based electron devices is not established, and it is required to bring out the superior transport properties of HfS2. In this report, we have investigated the effects of the atomic layer deposited HfO2 passivation on the current properties of HfS2 transistors. HfO2 passivation of the HfS2 surface enhanced the drain current and significantly reduced the hysteresis. Moreover, HfO2 passivation allows the use of a higher annealing temperature and further improvement of the drain current.
- リンク情報
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- DOI
- https://doi.org/10.1109/TNANO.2017.2661403
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000405391100008&DestApp=WOS_CPL
- URL
- http://www.scopus.com/inward/record.url?eid=2-s2.0-85029225442&partnerID=MN8TOARS
- ID情報
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- DOI : 10.1109/TNANO.2017.2661403
- ISSN : 1536-125X
- eISSN : 1941-0085
- ORCIDのPut Code : 47640533
- SCOPUS ID : 85029225442
- Web of Science ID : WOS:000405391100008