2017年3月
Distribution of the energy levels of individual interface traps and a fundamental refinement in charge pumping theory
JAPANESE JOURNAL OF APPLIED PHYSICS
- ,
- 巻
- 56
- 号
- 3
- 開始ページ
- 031301_1
- 終了ページ
- 031301_6
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.7567/JJAP.56.031301
- 出版者・発行元
- IOP PUBLISHING LTD
We carried out a unique and systematic characterization of single amphoteric Si/SiO2 interface traps using the charge pumping (CP) method. As a result, we obtained the distribution of the energy levels of these traps for the first time. The distribution is reasonably similar to that of the P-b0 density of states reported previously. By considering the essential nature of these traps (i.e., those with two energy levels), factors depending on the energy levels, and the Coulomb interactions between traps, we fundamentally corrected the conventional CP theory. (C) 2017 The Japan Society of Applied Physics
- リンク情報
- ID情報
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- DOI : 10.7567/JJAP.56.031301
- ISSN : 0021-4922
- eISSN : 1347-4065
- Web of Science ID : WOS:000395703600001