2003年5月
MgB2 thin film fabrication by rf magnetron sputtering
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS
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- 巻
- 388
- 号
- 開始ページ
- 115
- 終了ページ
- 116
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1016/S0921-4534(02)02675-8
- 出版者・発行元
- ELSEVIER SCIENCE BV
Superconducting MgB2 thin films on MgO substrate were fabricated by rf magnetron sputtering. Sputtering was preformed in a 50 mTorr Ar atmosphere at room temperature using sintered MgB2 or pure B and a Mg metal target. Sputtering deposition was followed by in situ annealing at 650 degreesC for 5 min in a high vacuum. The film deposited by a pure B and Mg metal had a superconducting transition temperature of 27 K. On the other hand, sputtering using a sintered target brought on the oxidation of Mg and obstructed the formation of superconducting thin films. (C) 2003 Elsevier Science B.V. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1016/S0921-4534(02)02675-8
- ISSN : 0921-4534
- eISSN : 1873-2143
- Web of Science ID : WOS:000183340300051