論文

査読有り 責任著者
2021年8月

A flat-lying dimer as a key intermediate in NO reduction on Cu(100)

PHYSICAL CHEMISTRY CHEMICAL PHYSICS
  • Kenta Kuroishi
  • Muhammad Rifqi Al Fauzan
  • Thanh Ngoc Pham
  • Yuelin Wang
  • Yuji Hamamoto
  • Kouji Inagaki
  • Akitoshi Shiotari
  • Hiroshi Okuyama
  • Shinichiro Hatta
  • Tetsuya Aruga
  • Ikutaro Hamada
  • Yoshitada Morikawa
  • 全て表示

23
31
開始ページ
16880
終了ページ
16887
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1039/d1cp02746h
出版者・発行元
ROYAL SOC CHEMISTRY

The reaction of nitric oxide (NO) on Cu(100) is studied by scanning tunneling microscopy, electron energy loss spectroscopy and density functional theory calculations. The NO molecules adsorb mainly as monomers at 64 K, and react and dissociate to yield oxygen atoms on the surface at similar to 70 K. The temperature required for the dissociation is significantly low for Cu(100), compared to those for Cu(111) and Cu(110). The minimum energy pathway of the reaction is via (NO)(2) formation, which converts into a flat-lying ONNO and then dissociates into N2O and O with a considerably low activation energy. We propose that the formation of (NO)(2) and flat-lying ONNO is the key to the exceptionally high reactivity of NO on Cu(100).

リンク情報
DOI
https://doi.org/10.1039/d1cp02746h
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000679468600001&DestApp=WOS_CPL
ID情報
  • DOI : 10.1039/d1cp02746h
  • ISSN : 1463-9076
  • eISSN : 1463-9084
  • Web of Science ID : WOS:000679468600001

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