Papers

Peer-reviewed
Sep, 2007

Evaluation of OKISOI technology

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
  • Y. Ikegami
  • Y. Arai
  • K. Hara
  • M. Hazumi
  • H. Ikeda
  • H. Ishino
  • T. Kohrikia
  • H. Miyake
  • A. Mochizuki
  • S. Terada
  • T. Tsuboyama
  • Y. Unno
  • Display all

Volume
579
Number
2
First page
706
Last page
711
Language
English
Publishing type
Research paper (scientific journal)
DOI
10.1016/j.nima.2007.05.272
Publisher
ELSEVIER SCIENCE BV

The silicon-on-insulator (SOI) CMOS technology has a number of advantages over the standard bulk CMOS technology, such as no latch-up effect, high speed and low power. The fully depleted SOI (FD-SOI) technology provided by OKI Electric Industry Co., Ltd. is realizing the full features of the advantages with lowest junction capacitance. Test element group (TEG) structures of transistors were fabricated and irradiated with protons. The first results are presented. (c) 2007 Published by Elsevier B.V.

Link information
DOI
https://doi.org/10.1016/j.nima.2007.05.272
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000249604700030&DestApp=WOS_CPL
ID information
  • DOI : 10.1016/j.nima.2007.05.272
  • ISSN : 0168-9002
  • Web of Science ID : WOS:000249604700030

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