2011年7月
Electrical Investigation of Notch Width Dependence of Domain Wall Structure in Co/Ni Nanowires
JAPANESE JOURNAL OF APPLIED PHYSICS
- ,
- ,
- ,
- ,
- ,
- ,
- ,
- 巻
- 50
- 号
- 7
- 開始ページ
- 1
- 終了ページ
- 73002
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1143/JJAP.50.073002
- 出版者・発行元
- JAPAN SOC APPLIED PHYSICS
We have investigated the notch width dependence of the domain wall structure by measuring the wall resistances in Co/Ni nanowires with perpendicular magnetization. Wall resistance was abruptly increased below a notch width of 43 nm. By comparing the experimental results with theoretical calculations of wall resistance and the micromagnetic simulation of wall energy, this increase in wall resistance was found to be caused by the change in the wall structure from the Bloch to Neel wall caused by the decreased notch width. (C) 2011 The Japan Society of Applied Physics
- リンク情報
- ID情報
-
- DOI : 10.1143/JJAP.50.073002
- ISSN : 0021-4922
- J-Global ID : 201102209440907748
- Web of Science ID : WOS:000292878200060